scholarly journals Physical Vapor Deposition of Cathode Materials for All Solid-State Li Ion Batteries: A Review

2021 ◽  
Vol 9 ◽  
Author(s):  
Berik Uzakbaiuly ◽  
Aliya Mukanova ◽  
Yongguang Zhang ◽  
Zhumabay Bakenov

With the development of smart electronics, a wide range of techniques have been considered for efficient co-integration of micro devices and micro energy sources. Physical vapor deposition (PVD) by means of thermal evaporation, magnetron sputtering, ion-beam deposition, pulsed laser deposition, etc., is among the most promising techniques for such purposes. Layer-by-layer deposition of all solid-state thin-film batteries via PVD has led to many publications in the last two decades. In these batteries, active materials are homogeneous and usually binder free, which makes them more promising in terms of energy density than those prepared by the traditional powder slurry technique. This review provides a summary of the preparation of cathode materials by PVD for all solid-state thin-film batteries. Cathodes based on intercalation and conversion reaction, as well as properties of thin-film electrode–electrolyte interface, are discussed.

2001 ◽  
Vol 695 ◽  
Author(s):  
Ilan Golecki ◽  
Margaret Eagan

ABSTRACTRhodium and iridium are highly electrically conductive refractory metals, which can be used as current-carrying thin-film metallizations. Their chemical inertness further enables their application at relatively high temperatures. However, due to the high elastic modulus of such metals, a residual tensile stress of 300 to 400 MPa is measured in evaporated thin films. We present novel results evidencing complete control over both the magnitude and the sign of the residual stress in such refractory thin films. The metallic layers are deposited by means of ion-beam-enhanced physical vapor deposition and both electrical resistivity and stress are controlled. Controlling the stress in this manner has enabled achieving thicker films and films with near-zero residual stress.


Author(s):  
B. Li ◽  
P. A. Clark ◽  
K. H. Church

The development of functional and reliable miniaturized devices including Micro Electro Mechanical Systems (MEMS) has stressed the manufacturing and packaging processes. The traditional micro fabrication techniques, such as lithography, physical vapor deposition (PVD), chemical vapor deposition (CVD) and etching, are layer-by-layer processes and mostly suitable for thin-filmed devices. LIGA (an acronym from German words for lithography, electroplating, and molding) is a newly developed process for thick metallic devices; however, it involves electroplating process and high quality molds, which are hard to move after electroforming. In all the processes mentioned above, masks and photoresist processing are inevitable, which complicates the whole process and increases the processing time and the total cost. It is also well known that packaging is another barrier for the advancement of MEMS. MEMS packaging, which is required to provide mechanical support, environmental protection and electrical connection to other system components, is much more complicated as compared to electronic components due to the moving structures, fluids or chemicals involved. It is the most expensive process in micromachining. Therefore, enabling tools and technologies are greatly needed for the fabrication and packaging of complicated devices and highly integrated micro assemblies. In this paper, we will present novel direct-print dispensing techniques and robust tools for 21st century manufacturing and packaging. Comparing to other dispensing technologies such as time-pressure needle dispensing, screen printing, pin transfer and jetting, nScrypt’s pumping techniques can dispense materials with precise volume control for 10’s of Pico liter resolution, accurate placement or alignment within a few microns, conformably print on exaggerated surfaces of 10’s of centimeters, and are extremely flexible with materials and patterns. The dispensing tip (nozzle) is optimized to reduce the pressure drop as compared to the traditional tubing needles. Comparing to traditional micro fabrication technologies, our direct-print dispensing technology is maskless and thus a cost effective process. While micro-dispensing is a solution based approach, it has the advantage of not being a wet process such as wet etching or electroplating. Direct-print dispensing of micro lines, micro dots, and three-dimensional structures will be presented. The technology has a wide range of applications in the manufacturing and packaging of micro/meso-scale devices and bio structures.


1994 ◽  
Vol 338 ◽  
Author(s):  
Cynthia G. Madras ◽  
L. Goldman ◽  
P.Y. Wong ◽  
I.N. Miaoulis

ABSTRACTAmorphous and polycrystalline silicon films are commonly used in a wide range of microelectronic and optical devices. Polycrystalline silicon is conventionally deposited by chemical vapor deposition (CVD) at temperatures in excess of 600°C. At these high deposition temperatures, thermal diffusion of dopants and thermally induced chemical reactions may occur within the substrate or device. Also, substrates with low melting temperatures such as germanium, may undergo irreversible deformation. In the present study, ion beam sputtering has been shown to enable the deposition of a stable polycrystalline silicon film on germanium as well as on silicon and glass substrates at temperatures as low as 350-400°C. The crystallization properties of silicon on the different substrate surfaces is reported. Crystallinity of the ion beam sputtered silicon films as a function of deposition temperature and substrate type is measured by X-Ray diffraction. These polysilicon films are shown to be thermally stable, have randomly oriented crystals, and have good adhesion to the substrates despite high compressive deposition stresses ranging from 700MPa to 1000MPa. Magnetron sputtered silicon films deposited on substrates in the same temperature range produced only completely amorphous films, with lower stresses and which are also thermally stable. This study demonstrated the feasibility of depositing extremely hard polycrystalline silicon films on germanium and other substrates by means of physical vapor deposition at temperatures as low as 350°C.


2021 ◽  
Vol 495 ◽  
pp. 229424
Author(s):  
Xubin Chen ◽  
Jordi Sastre ◽  
Matthias Rumpel ◽  
Andreas Flegler ◽  
Anurag Singhania ◽  
...  

2012 ◽  
Vol 1 (1) ◽  
pp. 46 ◽  
Author(s):  
Amir Mahyar Khorasani ◽  
Mohammad Reza Solymany yazdi ◽  
Mehdi Faraji ◽  
Alex Kootsookos

Thin-film coating plays a prominent role on the manufacture of many industrial devices. Coating can increase material performance due to the deposition process. Having adequate and precise model that can predict the hardness of PVD and CVD processes is so helpful for manufacturers and engineers to choose suitable parameters in order to obtain the best hardness and decreasing cost and time of industrial productions. This paper proposes the estimation of hardness of titanium thin-film layers as protective industrial tools by using multi-layer perceptron (MLP) neural network. Based on the experimental data that was obtained during the process of chemical vapor deposition (CVD) and physical vapor deposition (PVD), the modeling of the coating variables for predicting hardness of titanium thin-film layers, is performed. Then, the obtained results are experimentally verified and very accurate outcomes had been attained.


2018 ◽  
Vol 8 (30) ◽  
pp. 1870134 ◽  
Author(s):  
Chunguang Chen ◽  
Jos F. M. Oudenhoven ◽  
Dmitri L. Danilov ◽  
Egor Vezhlev ◽  
Lu Gao ◽  
...  

2016 ◽  
Vol 70 (11) ◽  
Author(s):  
Andreas Eder ◽  
Gerwin H.S. Schmid ◽  
Harald Mahr ◽  
Christoph Eisenmenger-Sittner

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