scholarly journals Enhanced Visible and Ultraviolet Light-Induced Gas-Phase Photocatalytic Activity of TiO2 Thin Films Modified by Increased Amount of Acetylacetone in Precursor Solution for Spray Pyrolysis

Catalysts ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 1011
Author(s):  
Jekaterina Spiridonova ◽  
Arvo Mere ◽  
Malle Krunks ◽  
Merilin Rosenberg ◽  
Anne Kahru ◽  
...  
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Spray Pyrolysis ◽  
Flow Reactor ◽  
Ultrasonic Spray Pyrolysis ◽  
Precursor Solution ◽  
Molar Ratio ◽  
Tio2 Thin Films ◽  
Ultrasonic Spray ◽  
Great Possibility

TiO2 thin films, modified by acetylacetone (AcacH) in solution, were deposited on glass substrate by ultrasonic spray pyrolysis and tested for photocatalytic activity in a multi-section continuous flow reactor by degradation of acetone and acetaldehyde under ultraviolet and visible light. The increase in molar ratio of AcacH in respect of titanium (IV) isopropoxide (TTIP) from 1:5 to 1:8 modified the electronic structure of the films, favoring enhanced photocatalytic activity. The photocatalytic activity was enhanced approximately twofold on the film with molar ratio 1:8 under both irradiations; the film completely oxidized 10 ppm of acetone and acetaldehyde. The photocatalytic efficacy of TiO2 films in oxidation of air pollutants was three times higher compared to the industrial glass Pilkington ActivTM. Moreover, all the synthesized films indicate antibacterial efficiency against E. coli of over 99% under ultraviolet. TiO2 film, with TTIP:AcacH molar ratio 1:8 having great possibility for its commercial use as a material for indoor air purification.

scholarly journals Thickness Effect on Photocatalytic Activity of TiO2 Thin Films Fabricated by Ultrasonic Spray Pyrolysis

Catalysts ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 1058
Author(s):  
Ibrahim Dundar ◽  
Arvo Mere ◽  
Valdek Mikli ◽  
Malle Krunks ◽  
Ilona Oja Acik
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Film Thickness ◽  
Stearic Acid ◽  
Spray Pyrolysis ◽  
Ultrasonic Spray Pyrolysis ◽  
Tio2 Films ◽  
Tio2 Thin Films ◽  
Ultrasonic Spray ◽  
Self Cleaning

In this study, TiO2 thin films were deposited by ultrasonic spray pyrolysis from solutions with concentrations of 0.1 and 0.2 M. The deposition temperature was adjusted at 350 °C and all samples were annealed at 500 °C for 1 h in air. The thickness of TiO2 films was changed in the range of 50 to ca. 800 nm by varying the number of spray cycles from 1 to 21 and the solution concentration. The results showed that the mean crystallite size of the anatase structure, the surface roughness, and light absorption increased with the film thickness. The effect of film thickness on the photocatalytic activity was investigated with the photodegradation of stearic acid under UV-A irradiation. The optimal thickness of TiO2 films fabricated by ultrasonic spray pyrolysis for photocatalytic self-cleaning applications was in the range of 170–230 nm, indicating a ca. 2.6 times-higher photocatalytic self-cleaning activity compared to the reference sample, Pilkington ActivTM. The photocatalytic results showed that the 190 nm-thick TiO2 film deposited from the 0.1 M solution applying seven spray cycles exhibited the finest grain structure and maximum photocatalytic activity, leading to 94% of stearic acid degradation in 180 min under UV-A light with the reaction rate constant k = 0.01648 min−1.

Preparation and photocatalytic properties of nanometer TiO2 thin films by improved ultrasonic spray pyrolysis

Rare Metals ◽  
2011 ◽  
Vol 30 (S1) ◽  
pp. 233-237 ◽  
Author(s):  
Da Li ◽  
Jun Zhang ◽  
Lexi Shao ◽  
Chaoyan Chen ◽  
Guiang Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Spray Pyrolysis ◽  
Ultrasonic Spray Pyrolysis ◽  
Photocatalytic Properties ◽  
Tio2 Thin Films ◽  
Ultrasonic Spray

scholarly journals Photocatalytic Degradation of Different VOCs in the Gas-Phase over TiO2 Thin Films Prepared by Ultrasonic Spray Pyrolysis

Catalysts ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 915 ◽  
Author(s):  
Ibrahim Dundar ◽  
Marina Krichevskaya ◽  
Atanas Katerski ◽  
Malle Krunks ◽  
Ilona Oja Acik
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Photocatalytic Degradation ◽  
Spray Pyrolysis ◽  
Tio2 Thin Film ◽  
Ultrasonic Spray Pyrolysis ◽  
Airflow Rate ◽  
Tio2 Films ◽  
Tio2 Thin Films ◽  
Ultrasonic Spray

In this study, we deposited TiO2 thin films onto borosilicate glass by ultrasonic spray pyrolysis at 350 and 450 °C. The aim of study is to determine the effect of deposition temperature on photocatalytic activity of TiO2 thin films and to investigate the performance of TiO2 thin films on photocatalytic degradation of methyl tert-butyl ether (MTBE), acetone, acetaldehyde, and heptane as functions of different operating parameters. TiO2 thin films deposited at 350 and 450 °C have a thickness value of 190 and 330 nm, respectively. All as-prepared TiO2 films possess an anatase crystalline structure. According to the X-ray photon spectroscopy (XPS) study, the TiO2 thin film deposited at 350 °C showed a higher amount of oxygen vacancies and hydroxyl groups on the film surface after UV treatment. The aged-TiO2 thin film deposited at 350 °C showed a water contact angle (WCA) value of 0° after 10 min UV irradiation, showing superhydrophilic surface behavior. The TiO2 film deposited at 350 °C exhibited the highest amount of conversion of MTBE (100%). The results also showed that TiO2 films are capable of photocatalytic degradation of MTBE (100%) and acetaldehyde (approx. 80%) in humid air conditions and high airflow rate. The visible-light-activity of TiO2 thin films was tested with 5 ppm MTBE and acetone. TiO2 thin films deposited at 350 °C with a surface area of 600 cm2 showed 60% of MTBE and 33% of acetone degradation under VIS light.

Effect of Solution Concentration on ZnO/ZnAl2O4 Nanocomposite Thin Films Formation Deposited by Ultrasonic Spray Pyrolysis on Glass and Si(111) Substrates

2020 ◽  
Vol 63 ◽  
pp. 10-30
Author(s):  
Sabrina Iaiche ◽  
Chahra Boukaous ◽  
David Alamarguy ◽  
Abdelkader Djelloul ◽  
Djamel Hamana
Keyword(s):  
Thin Films ◽  
Spray Pyrolysis ◽  
Near Infrared ◽  
Ultrasonic Spray Pyrolysis ◽  
Solution Concentration ◽  
Molar Ratio ◽  
Zno Films ◽  
Glass Layer ◽  
Ultrasonic Spray ◽  
Vis Spectroscopy

A complex ZnO/ZnAl2O4 heterostructures thin films on glass and Si (111) substrates have been successively obtained by a soft ultrasonic spray pyrolysis (USP) method deposition using the Zn/Al molar ratios concentrations of 0.07/0.13 and 0.1/0.1, respectively. According to (XRD) an ordered zinc oxide (ZnO) and zinc aluminate (ZnAl2O4) structures deposited onto glass from the air annealing at 500 °C during 2 hours was observed and confirmed by the (EDX), (FTIR) and Raman spectroscopy techniques. The estimated crystallites size and stress values of ZnO and ZnAl2O4 in the ZnO/ZnAl2O4/glass film were 19 nm/0.469 GPa and 11 nm/-0.292 GPa, respectively. The lower Zn/Al molar ratio around 0.035/0.06 produced only ZnO as a single phase, suggesting the Al insufficient quantity. The Si (100) substrate with 0.07 Zn molarity conducted to the Zn2SiO4/ZnO/ZnAl2O4 composite. The Raman integrated intensity bands of ZnO and ZnAl2O4 increases with increasing Zn to Al molar ratio (0.1/0.1 comparatively to 0.07/0.13). The ZnO&ZnAl2O4 crystallinity enhances as Zn molarity increases. The ZnO films in the composites grow with (002) texture. The TC(hkl) value indicated that ZnAl2O4 in the ZnO/ZnAl2O4/glass layer is polycrystalline preferentially oriented along the (311) plane. Spinel ZnAl2O4 oxide onto Si (111) substrate grown according to the (220) orientation. Crystallites are larger in ZnO/ZnAl2O4/Si than in ZnO/ZnAl2O4/glass. The ZnO/ZnAl2O4 film onto glass substrate is transparent in the visible and near infrared regions and sensitive to UV absorption, as characterized by UV-Vis spectroscopy. The ZnO and ZnAl2O4Egvalues in the ZnO/ZnAl2O4/glass composite were 3.25 and 3.88 eV, respectively.

scholarly journals TiO 2 thin films by ultrasonic spray pyrolysis as photocatalytic material for air purification

2019 ◽  
Vol 6 (2) ◽  
pp. 181578 ◽  
Author(s):  
Ibrahim Dundar ◽  
Marina Krichevskaya ◽  
Atanas Katerski ◽  
Ilona Oja Acik
Keyword(s):  
Thin Films ◽  
Spray Pyrolysis ◽  
Flow Reactor ◽  
Window Glass ◽  
Ultrasonic Spray Pyrolysis ◽  
Optical Measurements ◽  
Air Purification ◽  
Methyl Tert Butyl Ether ◽  
Spray Pyrolysis Method ◽  
Ultrasonic Spray

In this study, we showed that the TiO 2 thin films deposited onto window glass are practicable for air purification and self-cleaning applications. TiO 2 films were deposited onto window glass by ultrasonic spray pyrolysis method. Different deposition temperatures were used in the range of 250–450°C. The structural, morphological, optical properties and surface chemical composition were investigated to understand probable factors affecting photocatalytic performance and wettability of the TiO 2 thin films. The TiO 2 thin films were smooth, compacted and adhered adequately on the substrate with a thickness in the range of 100–240 nm. X-ray diffraction patterns revealed that all the TiO 2 thin films consisted of anatase phase structure with the mean crystallite size in the range of 13–35 nm. The optical measurements showed that the deposited films were highly transparent (approx. 85%). The wettability test results showed that the TiO 2 thin films sprayed at 350°C and 450°C and annealed at 500°C for 1 h were superhydrophilic. The photocatalytic activity of the films was tested for the degradation of methyl tert-butyl ether (MTBE) in multi-section plug-flow reactor. The TiO 2 film deposited at 350°C exhibited the highest amount of conversion of MTBE, approximately 80%.

Deposition of ZnO:Al Thin Films by Ultrasonic Spray Pyrolysis

2010 ◽  
Vol 150-151 ◽  
pp. 1617-1620 ◽  
Author(s):  
Lin Dong ◽  
Teng Fei Pei ◽  
Hong Qing Li ◽  
Da Yan Xu
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Spray Pyrolysis ◽  
Doping Level ◽  
Spray Pyrolysis Technique ◽  
Ultrasonic Spray Pyrolysis ◽  
Atmospheric Environment ◽  
Molar Ratio ◽  
Zno Films ◽  
Ultrasonic Spray

Transparent conducting Al-doped ZnO films were prepared by ultrasonic spray pyrolysis technique on amorphous glass substrates under atmospheric environment with substrate temperature ranging from 350 to 500 , and Al/ZnO molar ratio of 1, 3 and 5 %. The impacts of the substrate temperature and doping level on structural, optical and electrical properties of the ZnO:Al thin films were investigated. The texture coefficient calculated from XRD data indicates that the substrate temperature at 450 and the doping level of 3 at.% is beneficial for crystal growth along (002) orientation. The Band gap (Eg) and Urbach parameter (E0) deduced by the optical absorption edge increases and decreases with the increase of Al doping level, respectively. The increase in sheet resistance is assumed to be associated with the decrease in preferential orientation and formation of Al2O3-x clusters.

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