scholarly journals In Situ Characterization of Inconel 718 Post-Dynamic Recrystallization within a Scanning Electron Microscope

Metals ◽  
2017 ◽  
Vol 7 (11) ◽  
pp. 476 ◽  
Author(s):  
Meriem Zouari ◽  
Roland Logé ◽  
Nathalie Bozzolo
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Dynamic Recrystallization ◽  
Inconel 718 ◽  
In Situ Characterization ◽  
Scanning Electron

Development of Hybrid MEMS/FIB Processes and Applications of Three-pronged Active Nanotweezers For Manipulation of Nano Objects

2006 ◽  
Vol 983 ◽  
Author(s):  
Xuefeng Wang ◽  
Chang Liu
Keyword(s):  
Carbon Nanotubes ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
In Situ Characterization ◽  
End Effectors ◽  
Scanning Electron

AbstractWe report recent development of a three-probe micromachined nanomanipulator for manipulation and in-situ characterization of nanomaterials in scanning electron microscope (SEM). The nanomanipulator consists of three independent probes having thermal bimetallic actuators and nanoscopic end-effectors. Nanoscale end-effectors with sub-100-nm spacing are created using focused ion beam (FIB) milling to directly interface with nanoscopic objects (e.g., nanotubes, nanowires). Handling of individual carbon nanotubes (CNTs) was successfully realized with the nanomanipulator in an SEM.

scholarly journals Growth and nanomechanical characterization of nanoscale 3D architectures grown via focused electron beam induced deposition

Nanoscale ◽  
2017 ◽  
Vol 9 (42) ◽  
pp. 16349-16356 ◽  
Author(s):  
Brett B. Lewis ◽  
Brittnee A. Mound ◽  
Bernadeta Srijanto ◽  
Jason D. Fowlkes ◽  
George M. Pharr ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Electron Beam Induced Deposition ◽  
Scanning Electron

Nanomechanical measurements of platinum–carbon 3D nanoscale architectures grown via focused electron beam induced deposition (FEBID) were performed using a nanoindentation system in a scanning electron microscope (SEM) for simultaneous in situ imaging.

Characterization of Sputtered Films using the Scanning Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 44-45
Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtered Films ◽  
Plasma Sputtering ◽  
Microelectronic Devices ◽  
Control Film ◽  
Scanning Electron

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.

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