scholarly journals The optical parameters of TiO2 antireflection coating prepared by atomic layer deposition method for photovoltaic application

2020 ◽  
Vol 50 (4) ◽  
Author(s):  
Marek Szindler ◽  
Magdalena M. Szindler
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Energy Dispersive Spectrometer ◽  
Atomic Layer ◽  
Antireflection Coating ◽  
Optical Parameters ◽  
Tio2 Thin Films ◽  
Layer Deposition ◽  
Vis Spectroscopy ◽  
Titanium Dioxide Thin Films

Titanium dioxide thin films have been deposited on silicon wafers substrates by an atomic layer deposition (ALD) method. There optical parameters were investigated by spectroscopic ellipsometry and UV/VIS spectroscopy. A material with a refractive index of 2.41 was obtained. Additionally, in a wide spectral range it was possible to reduce the reflection from the silicon surface below 5%. The Raman spectroscopy method was used for structural characterization of anatase TiO2 thin films. Their uniformity and chemical composition are confirmed by a scanning electron microscope (SEM) energy dispersive spectrometer (EDS).

scholarly journals Structure and optical properties of TiO2 thin films deposited by ALD method

Open Physics ◽  
2017 ◽  
Vol 15 (1) ◽  
pp. 1067-1071 ◽  
Author(s):  
Marek Szindler ◽  
Magdalena M. Szindler ◽  
Paulina Boryło ◽  
Tymoteusz Jung
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Energy Dispersive Spectrometer ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
X Ray Crystallography ◽  
Systems Software ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method ◽  
Titanium Dioxide Thin Films

AbstractThis paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical composition were also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO2was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry.

Phase-gradient atomic layer deposition of TiO2 thin films by plasma-induced local crystallization

2021 ◽  
Author(s):  
Dohyun Go ◽  
Jaehyeong Lee ◽  
Jeong Woo Shin ◽  
Sungje Lee ◽  
Wangu Kang ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
Phase Gradient ◽  
Layer Deposition

scholarly journals Quantifying the Extent of Ligand Incorporation and the Effect on Properties of TiO2 Thin Films Grown by Atomic Layer Deposition Using an Alkoxide or an Alkylamide

2020 ◽  
Vol 32 (4) ◽  
pp. 1393-1407
Author(s):  
Maxime E. Dufond ◽  
Maïmouna W. Diouf ◽  
Clémence Badie ◽  
Carine Laffon ◽  
Philippe Parent ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
Layer Deposition

Selection of post-growth treatment parameters for atomic layer deposition of structurally disordered TiO2 thin films

2008 ◽  
Vol 354 (2-9) ◽  
pp. 404-408 ◽  
Author(s):  
S. Dueñas ◽  
H. Castán ◽  
H. García ◽  
L. Bailón ◽  
K. Kukli ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
Layer Deposition ◽  
Selection Of

Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films

Langmuir ◽  
2014 ◽  
Vol 30 (25) ◽  
pp. 7395-7404 ◽  
Author(s):  
Mikko Kaipio ◽  
Timothee Blanquart ◽  
Yoann Tomczak ◽  
Jaakko Niinistö ◽  
Marco Gavagnin ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Mechanistic Studies ◽  
Tio2 Thin Films ◽  
Layer Deposition
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