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Low-Temperature Growth of N-doped SiO2Layer Using Inductively-Coupled Plasma Oxidation and Its Effect on the Characteristics of Thin Film Transistors
Korean Journal of Materials Research
◽
10.3740/mrsk.2009.19.1.037
◽
2009
◽
Vol 19
(1)
◽
pp. 37-43
◽
Cited By ~ 1
Author(s):
Bo-Hyun Kim
◽
Seung-Ryul Lee
◽
Kyung-Min Ahn
◽
Seung-Mo Kang
◽
Yong-Ho Yang
◽
...
Keyword(s):
Thin Film
◽
Low Temperature
◽
Thin Film Transistors
◽
Inductively Coupled Plasma
◽
Plasma Oxidation
◽
Temperature Growth
◽
Low Temperature Growth
◽
Inductively Coupled
Download Full-text
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References
Low temperature growth of vertically aligned carbon nanofibres in a low frequency inductively coupled plasma reactor
2002 Conference on Optoelectronic and Microelectronic Materials and Devices. COMMAD 2002. Proceedings (Cat. No.02EX601)
◽
10.1109/commad.2002.1237221
◽
2005
◽
Cited By ~ 1
Author(s):
S. Xu
◽
Z. Tskadze
◽
J.D. Long
◽
K. Ostrikov
◽
N. Jiang
Keyword(s):
Low Temperature
◽
Inductively Coupled Plasma
◽
Plasma Reactor
◽
Low Frequency
◽
Carbon Nanofibres
◽
Temperature Growth
◽
Low Temperature Growth
◽
Inductively Coupled
◽
Inductively Coupled Plasma Reactor
◽
Vertically Aligned
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Effects of inductively coupled plasma oxidation on the properties of polycrystalline silicon films and thin film transistors
Applied Physics Letters
◽
10.1063/1.123939
◽
1999
◽
Vol 74
(18)
◽
pp. 2693-2695
◽
Cited By ~ 15
Author(s):
Yong Woo Choi
◽
Sang Won Park
◽
Byung Tae Ahn
Keyword(s):
Thin Film
◽
Thin Film Transistors
◽
Inductively Coupled Plasma
◽
Polycrystalline Silicon
◽
Silicon Films
◽
Plasma Oxidation
◽
Inductively Coupled
◽
Polycrystalline Silicon Films
Download Full-text
Low-Temperature Growth Process of Polycrystalline Silicon for Thin Film Transistors.
Shinku
◽
10.3131/jvsj.37.875
◽
1994
◽
Vol 37
(11)
◽
pp. 875-880
◽
Cited By ~ 1
Author(s):
Tatsuru SHIRAFUJI
◽
Kunihide TACHIBANA
Keyword(s):
Thin Film
◽
Low Temperature
◽
Thin Film Transistors
◽
Polycrystalline Silicon
◽
Growth Process
◽
Temperature Growth
◽
Low Temperature Growth
Download Full-text
Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
Japanese Journal of Applied Physics
◽
10.1143/jjap.36.3714
◽
1997
◽
Vol 36
(Part 1, No. 6A)
◽
pp. 3714-3720
◽
Cited By ~ 61
Author(s):
Masashi Goto
◽
Hirotaka Toyoda
◽
Masatoshi Kitagawa
◽
Takashi Hirao
◽
Hideo Sugai
Keyword(s):
Low Temperature
◽
Inductively Coupled Plasma
◽
Polycrystalline Silicon
◽
Silicon Films
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Temperature Growth
◽
Low Temperature Growth
◽
Inductively Coupled
◽
Polycrystalline Silicon Films
Download Full-text
Low-temperature growth of gallium nitride films by inductively coupled-plasma-enhanced reactive magnetron sputtering
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
◽
10.1116/1.4871472
◽
2014
◽
Vol 32
(3)
◽
pp. 031514
◽
Cited By ~ 6
Author(s):
Chih-Jui Ni
◽
Franklin Chau-Nan Hong
Keyword(s):
Gallium Nitride
◽
Low Temperature
◽
Magnetron Sputtering
◽
Inductively Coupled Plasma
◽
Reactive Magnetron Sputtering
◽
Reactive Magnetron
◽
Temperature Growth
◽
Low Temperature Growth
◽
Inductively Coupled
Download Full-text
Low temperature growth of graphene using inductively-coupled plasma chemical vapor deposition
Surface and Coatings Technology
◽
10.1016/j.surfcoat.2016.10.081
◽
2017
◽
Vol 309
◽
pp. 814-819
◽
Cited By ~ 12
Author(s):
Sami Pekdemir
◽
M. Serdar Onses
◽
Mehmet Hancer
Keyword(s):
Chemical Vapor Deposition
◽
Low Temperature
◽
Vapor Deposition
◽
Inductively Coupled Plasma
◽
Chemical Vapor
◽
Plasma Chemical
◽
Temperature Growth
◽
Low Temperature Growth
◽
Plasma Chemical Vapor Deposition
◽
Inductively Coupled
Download Full-text
Possibility of Low Temperature Growth of YBCO Thin Film by Low Energy Ion Assisted Deposition
Advances in Superconductivity V
◽
10.1007/978-4-431-68305-6_224
◽
1993
◽
pp. 1001-1004
Author(s):
Masao Noma
◽
Masami Nakasone
◽
Soichi Ogawa
◽
Tsutom Yotsuya
◽
Yoshihiko Suzuki
Keyword(s):
Thin Film
◽
Low Temperature
◽
Low Energy
◽
Ybco Thin Film
◽
Temperature Growth
◽
Low Temperature Growth
Download Full-text
A Very Low-Temperature Growth of BaTiO3 Thin Film by Hydrothermal Treatment Following Sol-Gel Coating at 200 Degree Celsius
Integrated Ferroelectrics
◽
10.1080/743845161
◽
2003
◽
Vol 52
(1)
◽
pp. 111-118
Author(s):
Zhiqiang Wei
◽
Minoru Noda
◽
Masanori Okuyama
Keyword(s):
Thin Film
◽
Low Temperature
◽
Hydrothermal Treatment
◽
Sol Gel
◽
Temperature Growth
◽
Low Temperature Growth
◽
Batio3 Thin Film
◽
Very Low Temperature
Download Full-text
A Very Low-Temperature Growth of BaTiO3 Thin Film by Hydrothermal Treatment Following Sol-Gel Coating at 200 Degree Celsius
Integrated Ferroelectrics
◽
10.1080/10584580390254204
◽
2003
◽
Vol 52
(1)
◽
pp. 111-118
◽
Cited By ~ 3
Author(s):
Zhiqiang Wei
◽
Minoru Noda
◽
Masanori Okuyama
Keyword(s):
Thin Film
◽
Low Temperature
◽
Hydrothermal Treatment
◽
Sol Gel
◽
Temperature Growth
◽
Low Temperature Growth
◽
Batio3 Thin Film
◽
Very Low Temperature
Download Full-text
Low temperature growth technique for nanocrystalline cuprous oxide thin films using microwave plasma oxidation of copper
Materials Letters
◽
10.1016/j.matlet.2011.12.044
◽
2012
◽
Vol 71
◽
pp. 160-163
◽
Cited By ~ 10
Author(s):
K.V. Rajani
◽
S. Daniels
◽
E. McGlynn
◽
R. P Gandhiraman
◽
R. Groarke
◽
...
Keyword(s):
Thin Films
◽
Low Temperature
◽
Cuprous Oxide
◽
Microwave Plasma
◽
Plasma Oxidation
◽
Oxide Thin Films
◽
Growth Technique
◽
Temperature Growth
◽
Low Temperature Growth
Download Full-text
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