scholarly journals Low-Temperature Growth of N-doped SiO2Layer Using Inductively-Coupled Plasma Oxidation and Its Effect on the Characteristics of Thin Film Transistors

2009 ◽  
Vol 19 (1) ◽  
pp. 37-43 ◽  
Author(s):  
Bo-Hyun Kim ◽  
Seung-Ryul Lee ◽  
Kyung-Min Ahn ◽  
Seung-Mo Kang ◽  
Yong-Ho Yang ◽  
...  
1993 ◽  
pp. 1001-1004
Author(s):  
Masao Noma ◽  
Masami Nakasone ◽  
Soichi Ogawa ◽  
Tsutom Yotsuya ◽  
Yoshihiko Suzuki

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