scholarly journals Low temperature growth technique for nanocrystalline cuprous oxide thin films using microwave plasma oxidation of copper

2012 ◽  
Vol 71 ◽  
pp. 160-163 ◽  
Author(s):  
K.V. Rajani ◽  
S. Daniels ◽  
E. McGlynn ◽  
R. P Gandhiraman ◽  
R. Groarke ◽  
...  
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Vol 46 (47) ◽  
pp. 16551-16561 ◽  
Author(s):  
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Julian Rechmann ◽  
Morteza Aghaee ◽  
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...  

Lowest temperature to date for the ALD growth of Ga2O3 thin films and the 2nd highest GPC regarding Ga2O3 ALD.


2021 ◽  
pp. 151405
Author(s):  
Yoonseo Jang ◽  
Dohwan Jung ◽  
Prakash R. Sultane ◽  
Eric S. Larsen ◽  
Christopher W. Bielawski ◽  
...  

2020 ◽  
Vol 38 (2) ◽  
pp. 022404 ◽  
Author(s):  
Ali Mahmoodinezhad ◽  
Christoph Janowitz ◽  
Franziska Naumann ◽  
Paul Plate ◽  
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...  

2007 ◽  
Vol 463-465 ◽  
pp. 644-648 ◽  
Author(s):  
S. Funaki ◽  
Y. Yoshida ◽  
Y. Ichino ◽  
M. Miura ◽  
Y. Takai ◽  
...  

2002 ◽  
Vol 186 (1-4) ◽  
pp. 173-178 ◽  
Author(s):  
T Tsuchiya ◽  
A Watanabe ◽  
H Niino ◽  
A Yabe ◽  
I Yamaguchi ◽  
...  

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