Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma

1997 ◽  
Vol 36 (Part 1, No. 6A) ◽  
pp. 3714-3720 ◽  
Author(s):  
Masashi Goto ◽  
Hirotaka Toyoda ◽  
Masatoshi Kitagawa ◽  
Takashi Hirao ◽  
Hideo Sugai
Keyword(s):  
Low Temperature ◽  
Inductively Coupled Plasma ◽  
Polycrystalline Silicon ◽  
Silicon Films ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Inductively Coupled ◽  
Polycrystalline Silicon Films

scholarly journals Low Temperature Growth of Polycrystalline Silicon Films by RF Sputtering Method(1st Report).

1995 ◽  
Vol 61 (6) ◽  
pp. 829-833
Author(s):  
Hiroaki KAKIUCHI ◽  
Hideaki KAWABE ◽  
Kumayasu YOSHII ◽  
Kiyoshi YASUTAKE ◽  
Akihiro TAKEUCHI ◽  
...  
Keyword(s):  
Low Temperature ◽  
Polycrystalline Silicon ◽  
Rf Sputtering ◽  
Silicon Films ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Polycrystalline Silicon Films

scholarly journals Control of grain size during low-temperature growth of polycrystalline silicon films

2004 ◽  
Vol 53 (11) ◽  
pp. 3950
Author(s):  
Huang Rui ◽  
Lin Xuan-Ying ◽  
Yu Yun-Peng ◽  
Lin Kui-Xun ◽  
Yao Ruo-He ◽  
...  
Keyword(s):  
Grain Size ◽  
Low Temperature ◽  
Polycrystalline Silicon ◽  
Silicon Films ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Polycrystalline Silicon Films
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