Influence of Substrate Temperature on Properties of Aluminum-Doped Zinc Oxide Films Prepared by DC Magnetron Sputtering

2011 ◽  
Vol 31 (5) ◽  
pp. 0531001 ◽  
Author(s):  
杨昌虎 Yang Changhu ◽  
马忠权 Ma Zhongquan ◽  
袁剑辉 Yuan Jianhui
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Zinc Oxide Films ◽  
Aluminum Doped Zinc Oxide ◽  
Influence Of Substrate

Structure and Internal Stress of Tin-Doped Indium Oxide and Indium–Zinc Oxide Films Deposited by DC Magnetron Sputtering

2007 ◽  
Vol 46 (12) ◽  
pp. 7806-7811 ◽  
Author(s):  
Eriko Nishimura ◽  
Tomoko Sasabayashi ◽  
Norihiro Ito ◽  
Yasushi Sato ◽  
Kentaro Utsumi ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Internal Stress ◽  
Indium Oxide ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Zinc Oxide Films ◽  
Indium Zinc Oxide

Crystallinity of Gallium-Doped Zinc Oxide Films Deposited by DC Magnetron Sputtering Using Ar, Ne or Kr Gas

2002 ◽  
Vol 41 (Part 1, No. 10) ◽  
pp. 6174-6179 ◽  
Author(s):  
Masato Kon ◽  
Pung Keun Song ◽  
Akira Mitsui ◽  
Yuzo Shigesato
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Zinc Oxide Films
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