Deposition and Characterization of Low-Dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections

Characterization of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00233-0 ◽

2003 ◽

Vol 171 (1-3) ◽

pp. 39-45 ◽

Cited By ~ 46

Author(s):

Hyeong Joon Kim ◽

Qingyi Shao ◽

Yoon-Hae Kim

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Deposition and Characterization of Porous Low-Dielectric-Constant SiOC(-H) Thin Films Deposited from TES/O2 precursors by Using Plasma-Enhanced Chemical Vapor Deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.53.351 ◽

2008 ◽

Vol 53 (1) ◽

pp. 351-356 ◽

Cited By ~ 6

Author(s):

Rangaswamy Navamathavan ◽

Chang Young Kim ◽

An Soo Jung ◽

Chi Kyu Choi ◽

Heon Ju Lee

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Polymer-like Organic Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition Using the Para-xylene Precursor as Low Dielectric Constant Interlayer Dielectrics for Multilevel Metallization

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.1356 ◽

1999 ◽

Vol 38 (Part 1, No. 3A) ◽

pp. 1356-1358 ◽

Cited By ~ 33

Author(s):

Yong Chun Quan ◽

Jongryang Joo ◽

Donggeun Jung

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Thin Films ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Para Xylene

Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.1809 ◽

1998 ◽

Vol 37 (Part 1, No. 4A) ◽

pp. 1809-1814 ◽

Cited By ~ 30

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi ◽

Yoshihisa Matsubara ◽

Tadahiko Horiuchi

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Carbon Thin Films

Nitrogen doped fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Applied Physics Letters ◽

10.1063/1.115761 ◽

1996 ◽

Vol 68 (25) ◽

pp. 3656-3658 ◽

Cited By ~ 24

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Nitrogen Doped ◽

Mechanical characterization of zeolite low dielectric constant thin films by nanoindentation

Thin Solid Films ◽

10.1016/j.tsf.2006.01.048 ◽

2007 ◽

Vol 515 (6) ◽

pp. 3164-3170 ◽

Cited By ~ 45

Author(s):

Mark Johnson ◽

Zijian Li ◽

Junlan Wang ◽

Yushan Yan

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Mechanical Characterization ◽

Low Dielectric Constant ◽

Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Journal of Applied Physics ◽

10.1063/1.360313 ◽

1995 ◽

Vol 78 (2) ◽

pp. 1370-1372 ◽

Cited By ~ 127

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Carbon Thin Films

Characterization of Chemical Vapor Deposited Amorphous Fluorocarbons for Low Dielectric Constant Interlayer Dielectrics

Journal of The Electrochemical Society ◽

10.1149/1.1391917 ◽

1999 ◽

Vol 146 (6) ◽

pp. 2219-2224 ◽

Cited By ~ 18

Author(s):

Indrajit Banerjee ◽

Marnie Harker ◽

L. Wong ◽

P. A. Coon ◽

Karen K. Gleason

Keyword(s):

Dielectric Constant ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Chemical Vapor Deposited

Amorphous carbon thin films containing benzene rings for use as low-dielectric-constant interlayer dielectrics

Applied Physics Letters ◽

10.1063/1.118935 ◽

1997 ◽

Vol 70 (19) ◽

pp. 2616-2618 ◽

Cited By ~ 28

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Benzene Rings ◽

Carbon Thin Films

Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Applied Physics Letters ◽

10.1063/1.116350 ◽

1996 ◽

Vol 68 (20) ◽

pp. 2864-2866 ◽

Cited By ~ 75

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Helicon Plasma ◽

Interlayer Dielectrics ◽