Deposition and Characterization of Porous Low-Dielectric-Constant SiOC(-H) Thin Films Deposited from TES/O2 precursors by Using Plasma-Enhanced Chemical Vapor Deposition
2008 ◽
Vol 53
(1)
◽
pp. 351-356
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2000 ◽
Vol 39
(Part 2, No. 12B)
◽
pp. L1324-L1326
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2006 ◽
Vol 24
(1)
◽
pp. 165-169
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2005 ◽
Vol 44
(7A)
◽
pp. 4886-4890
◽
1999 ◽
Vol 38
(Part 1, No. 3A)
◽
pp. 1356-1358
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2008 ◽
Vol 53
(9(5))
◽
pp. 2512-2517