Characterization of Chemical Vapor Deposited Amorphous Fluorocarbons for Low Dielectric Constant Interlayer Dielectrics

1999 ◽  
Vol 146 (6) ◽  
pp. 2219-2224 ◽  
Author(s):  
Indrajit Banerjee ◽  
Marnie Harker ◽  
L. Wong ◽  
P. A. Coon ◽  
Karen K. Gleason
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor ◽  
Low Dielectric Constant ◽  
Interlayer Dielectrics ◽  
Low Dielectric ◽  
Chemical Vapor Deposited

Deposition and Characterization of Low-Dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections

2007 ◽  
Vol 50 (6) ◽  
pp. 1803 ◽  
Author(s):  
Rangaswamy Navamathavan ◽  
An Soo Jung ◽  
Hyun Seung Kim ◽  
Young Jun Jang ◽  
Chi Kyu Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Low Dielectric Constant ◽  
Interlayer Dielectrics ◽  
Low Dielectric

Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

2001 ◽  
Vol 148 (6) ◽  
pp. F115 ◽  
Author(s):  
Zhen-Cheng Wu ◽  
Zhi-Wen Shiung ◽  
Chiu-Chih Chiang ◽  
Wei-Hao Wu ◽  
Mao-Chieh Chen ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor ◽  
Low Dielectric Constant ◽  
Electrical Characteristics ◽  
Low Dielectric ◽  
Chemical Vapor Deposited
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