Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor

2009 ◽  
Vol 54 (3) ◽  
pp. 1330-1333 ◽  
Author(s):  
Dae-Yong Moon ◽  
Woong-Sung Kim ◽  
Tae-Sub Kim ◽  
Byung-Woo Kang ◽  
Jong-Wan Park ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Seed Layers

AlN and AlN/Al2O3 seed layers from atomic layer deposition for epitaxial growth of AlN on sapphire

2019 ◽  
Vol 37 (2) ◽  
pp. 020914 ◽  
Author(s):  
Sylvia Hagedorn ◽  
Arne Knauer ◽  
Markus Weyers ◽  
Franziska Naumann ◽  
Hassan Gargouri
Keyword(s):  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Seed Layers

Characteristics of copper films produced via atomic layer deposition

2002 ◽  
Vol 17 (9) ◽  
pp. 2394-2398 ◽  
Author(s):  
Jinshan Huo ◽  
Raj Solanki ◽  
James McAndrew
Keyword(s):  
Water Vapor ◽  
Electrical Properties ◽  
Aspect Ratio ◽  
Atomic Layer Deposition ◽  
Deposition Temperature ◽  
Atomic Layer ◽  
Copper Films ◽  
Layer Deposition ◽  
Subsequent Step ◽  
Seed Layers

Properties of copper films produced using atomic layer deposition (ALD) were characterized. Composition, morphology, and electrical properties of these films grown on glass, as well as Ta, TiN, and TaN on silicon wafers were examined. The resistivity of films thicker than about 60 nm was near bulk value. Films were deposited using a two-step ALD process in which copper(II)-1,1,1,5,5,5,-hexafluoroacetylacetonate hydrate and water vapor were introduced in the first step and a reducing agent was introduced in a subsequent step. Five reducing agents were evaluated, with the best results obtained using isopropanol or formalin. The optimum deposition temperature with isopropanol was about 260 °C, whereas it was about 300 °C with formalin. These films were also investigated as seed layers for electrodeposition of thicker Cu layers for possible interconnect applications. Excellent fills in high aspect ratio trenches were demonstrated.

scholarly journals Photocurrent detection of chemically tuned hierarchical ZnO nanostructures grown on seed layers formed by atomic layer deposition

2012 ◽  
Vol 7 (1) ◽  
pp. 290 ◽  
Author(s):  
Seokhwan Bang ◽  
Seungjun Lee ◽  
Youngbin Ko ◽  
Joohyun Park ◽  
Seokyoon Shin ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Nanostructures ◽  
Layer Deposition ◽  
Seed Layers

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

2021 ◽  
Vol 3 (1) ◽  
pp. 59-71
Author(s):  
Degao Wang ◽  
Qing Huang ◽  
Weiqun Shi ◽  
Wei You ◽  
Thomas J. Meyer
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dye Sensitized ◽  
Layer Deposition
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