Low Temperature Deposition of HfO2 Gate Insulator on SiC by Metalorganic Chemical Vapor Deposition
2006 ◽
pp. 1079-1082
2006 ◽
Vol 527-529
◽
pp. 1079-1082
◽
1998 ◽
Vol 21
(1-4)
◽
pp. 355-366
◽
2000 ◽
Vol 39
(Part 1, No. 2A)
◽
pp. 572-576
◽
2001 ◽
Vol 40
(Part 2, No. 4A)
◽
pp. L343-L345
◽
1990 ◽
pp. 217-222