Low Pressure RF Capacitively Coupled Plasma Reactor for Modification of Seeds, Polymers and Textile Fabrics

2005 ◽  
pp. 291-296 ◽  
Author(s):  
N. Puač ◽  
Z.Lj. Petrović ◽  
M. Radetić ◽  
A. Djordjević
Keyword(s):  
Plasma Reactor ◽  
Low Pressure ◽  
Capacitively Coupled ◽  
Textile Fabrics ◽  
Capacitively Coupled Plasma

Low Pressure RF Capacitively Coupled Plasma Reactor for Modification of Seeds, Polymers and Textile Fabrics

2005 ◽  
Vol 494 ◽  
pp. 291-296 ◽  
Author(s):  
N. Puač ◽  
Z.Lj. Petrović ◽  
M. Radetić ◽  
A. Djordjević
Keyword(s):  
Plasma Reactor ◽  
Operation Mode ◽  
Polymer Surfaces ◽  
Plasma Reactors ◽  
Capacitively Coupled ◽  
Textile Materials ◽  
Textile Fabrics ◽  
Capacitively Coupled Plasma ◽  
Reactor Operating ◽  
Low Pressures

Plasma reactor operating at low pressures (0.2-1 Torr) at 13.56 MHz has been developed with an idea to optimize the treatment of polymers, biological and textile materials. The reactor proved very effective in treatment of polymer surfaces and wool fabrics in order to improve wettability, efficiency of dyeing and printing as well as to reduce the felting shrinkage. It also gave good results in improving germination of seeds. The basic conditions that the reactor has to satisfy are: the energy of ions that hit the surface has to be low and the reactor should be efficient in production of active radicals. Two systems with different geometries were studied, both capacitively coupled plasma reactors operating at 13.56 MHz. Cylindrical geometry was selected in order to minimize the energy of ions reaching the surface. Modeling of the discharge was performed with an aim to verify the energy distribution function of ions. As a critical diagnostic test of the system, voltage and current probes were developed to check the operation mode of the discharge. Oxygen, air and argon were used with different results.

scholarly journals A technique for evaluating the RF voltage across the electrodes of a capacitively-coupled plasma reactor

2006 ◽  
Vol 36 (2) ◽  
pp. 177-182 ◽  
Author(s):  
V. Lisovskiy ◽  
J.-P. Booth ◽  
K. Landry ◽  
D. Douai ◽  
V. Cassagne ◽  
...  
Keyword(s):  
Plasma Reactor ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

scholarly journals Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 999
Author(s):  
Ho Jun Kim
Keyword(s):  
Deposition Rate ◽  
Complex Geometry ◽  
Plasma Reactor ◽  
Three Dimensional ◽  
Multiple Roles ◽  
Capacitively Coupled ◽  
Large Particles ◽  
Capacitively Coupled Plasma ◽  
Physical Phenomena ◽  
Number Of Particles

Increasing the productivity of a showerhead-type capacitively coupled plasma (CCP) reactor requires an in-depth understanding of various physical phenomena related to the showerhead, which is not only responsible for gas distribution, but also acts as the electrode. Thus, we investigated how to enhance the cleanliness and deposition rate by studying the multiple roles of the showerhead electrode in a CCP reactor. We analyzed the gas transport in a three-dimensional complex geometry, and the SiH4/He discharges were simulated in a two-dimensional simplified geometry. The process volume was installed between the showerhead electrode (radio frequency powered) and the heater electrode (grounded). Our aim of research was to determine the extent to which the heated showerhead contributed to increasing the deposition rate and to reducing the size of the large particles generated during processing. The temperature of the showerhead was increased to experimentally measure the number of particles transported onto the heater to demonstrate the effects thereof on the decrease in contamination. The number of particles larger than 45 nm decreased by approximately 93% when the showerhead temperature increased from 373 to 553 K.

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