Research on the Cleaning Technology of Sapphire Substrates Precision Process for LED
2012 ◽
Vol 452-453
◽
pp. 1415-1419
Keyword(s):
The signification of the cleaning of sapphire substrates in precision processing has been presented. The cleaning principles of sapphire substrates have been discussed. The cleaning solution and technology of the sapphire substrates for international production have been presented by cleaning experiments. The size of dust is smaller than 0.13 . The sum of dusts is less than 5 for every substrate. Sapphire substrates can be used in metal organic chemical vapor deposition of GaN without re-cleaning by this method.
2012 ◽
Vol 61
(4)
◽
pp. 618-622
◽
2016 ◽
Vol 33
(6)
◽
pp. 068102
◽
2000 ◽
Vol 7
(1)
◽
pp. 12
2021 ◽
Vol 15
(6)
◽
pp. 2170024