CVD Diamond Film Polishing Based on Accelerant Theory

2012 ◽  
Vol 497 ◽  
pp. 185-189
Author(s):  
Li Zhang ◽  
Shao Jie Ding ◽  
Dong Hui Wen ◽  
Zhen Hao Xu ◽  
Shi Ming Ji
Keyword(s):  
Diamond Film ◽  
High Efficiency ◽  
Low Cost ◽  
Cvd Diamond ◽  
Reaction Rates ◽  
Precision Machining ◽  
Key Technologies ◽  
Ultra Precision ◽  
New Type ◽  
Cvd Diamond Film

CVD diamond has become the mainstream trend for the development of diamond. Its ultra precision machining is one of the key technologies for expanding the application of CVD diamond film. The efficient polishing method is studied, called accelerant polishing technology, which can lower the activation energy needed in diamond graphitization by the accelerant action of transition metal. It accelerates reaction rates of graphitization and promotes the implementation of diamond’s removal mechanism. Experimentation results indicate that the polishing method is one new type of precision polishing technology with low cost and high efficiency.

Polishing of Free-Standing CVD Diamond Films by the Combination of EDM and CMP

2008 ◽  
Vol 53-54 ◽  
pp. 111-118
Author(s):  
Ze Wei Yuan ◽  
Zhu Ji Jin ◽  
B.X. Dong ◽  
Ren Ke Kang
Keyword(s):  
Diamond Film ◽  
High Efficiency ◽  
Cvd Diamond ◽  
Large Area ◽  
Free Standing ◽  
Electro Discharge Machining ◽  
Diamond Polishing ◽  
Before And After ◽  
Cvd Diamond Film

Although various diamond polishing techniques have been studied for many years, no individual method can polish free-standing CVD diamond film with high efficiency and high polishing quality. This paper investigates polishing CVD diamond film by the combination of electro-discharge machining (EDM) and chemical mechanical polishing (CMP). Scanning electro microscopy, Optical microscopy, Energy dispersive X-ray analysis, Talysurf surface profiler and Raman spectroscopy were used to evaluate the surface integrity and quality of diamond film before and after polishing. Based on the experimental results, the material removal during EDM process can be a chemo-mechanical process, including gasification, melting, sputtering, oxidation and graphitization. While in CMP process, diamond was removed under the mechanical and tribochemical interaction. The combination of EDM and CMP has advantages of high efficiency, high polishing quality and low damage. It is suitable to polish large area free-standing CVD diamond film.

Surface Uniformity of CVD Diamond Film Polishing by Catalytic Polishing Method

2013 ◽  
Vol 546 ◽  
pp. 102-106
Author(s):  
Di Feng Zhou ◽  
Xiu Lian Zheng ◽  
Chen Ruan ◽  
Li Zhang
Keyword(s):  
Diamond Film ◽  
Velocity Ratio ◽  
Rotation Velocity ◽  
Cvd Diamond ◽  
Main Trend ◽  
High Uniformity ◽  
Mechanics Analysis ◽  
Key Technologies ◽  
Cvd Diamond Film

CVD diamond is the main trend of future diamond materials. Surface uniformity of CVD diamond film polishing is one of the key technologies to expand the application of CVD diamond. Based on the catalytic polishing method, rotation velocity of the planet wheel is achieved when the lapping plate is in different rotation velocity and different bias distance by mechanics analysis. The lapping surface uniformity is analyzed to find out the best bias distance and velocity ratio by simulating the lapping times of different CVD diamond film with different velocity ratio and bias distance. At last, the lapping planet velocity and bias distance are achieved when polishing is in the best condition. The high uniformity surface can be achieved when polishing is carried out in these parameters.

Current Situation and Trend of Ultra-Precision Abrasive Machining

2007 ◽  
Vol 364-366 ◽  
pp. 690-695
Author(s):  
Ju Long Yuan ◽  
D.X. Hu ◽  
Zhi Wei Wang ◽  
Dong Hui Wen
Keyword(s):  
High Efficiency ◽  
Low Cost ◽  
Development Trend ◽  
Precision Machining ◽  
Abrasive Machining ◽  
Machining Processes ◽  
Increasing Trend ◽  
Ultra Precision ◽  
The Development Trend ◽  
Fixed Abrasive

With increasing trend toward automatic manufacture and demands for improved quality, position of ultra-precision machining processes is considered as more and more important. As the main processes of ultra-precision machining, abrasive machining processes can be chiefly divided into free abrasive processes and fixed abrasive processes. Typical techniques such as chemicalmechanical polishing, ELID, Flat Honing and so on have been reviewed and compared with each other in preliminary aspects such as surface quality, finish accuracy and finish efficiency. The development trend of ultra-precision abrasive machining will have great efforts on realizing the integration with high accuracy, high efficiency and low cost.

Interface Temperature Measurement and Experimental Studies of Super-High Speed Polishing of CVD Diamond Films

2010 ◽  
Vol 135 ◽  
pp. 271-276
Author(s):  
Shu Tao Huang ◽  
Li Zhou ◽  
Li Fu Xu
Keyword(s):  
Stainless Steel ◽  
Temperature Measurement ◽  
Temperature Rise ◽  
Diamond Film ◽  
High Speed ◽  
Experimental Studies ◽  
Pure Titanium ◽  
Cvd Diamond ◽  
Interface Temperature ◽  
Cvd Diamond Film

Super-high speed polishing of diamond film is a newly proposed method due to its outstanding features such as low cost and simple apparatus. The interface temperature rise is due to the friction force and the relative sliding velocity between the CVD diamond film and the polishing metal plate surface. In this paper, the interface temperature rise in super-high speed polishing of CVD diamond film was investigated by using the single-point temperature measurement method. Additionally, the influence of polishing plate material on the characteristics of super-high speed polishing has been studied. The results showed that cast iron is not suitable for super-high polishing, while both 0Cr18Ni9 stainless steel and pure titanium can be used for the super-high polishing of CVD diamond film. The quality and efficiency of polishing with 0Cr18Ni9 stainless steel plate is much higher than those of pure titanium, and the material removal rate could reach to 36-51 m/h when the polishing speed and pressure are 100 m/s and 0.17-0.31 MPa, respectively.

scholarly journals Synthesis of Microwave Plasma CVD Diamond-Film on Variously-Coated Carbon-Steel Substrates.

1996 ◽  
Vol 47 (7) ◽  
pp. 611-615
Author(s):  
Hiroyuki TANAKA ◽  
Toshiaki TANAKA ◽  
Hideaki SOHMA ◽  
Masato YOSHIDA ◽  
Akira SAKAI ◽  
...  
Keyword(s):  
Carbon Steel ◽  
Diamond Film ◽  
Microwave Plasma ◽  
Cvd Diamond ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Cvd Diamond Film ◽  
Steel Substrates ◽  
Coated Carbon

scholarly journals Study on Polishing of CVD Diamond Film (2nd report)

2005 ◽  
Vol 71 (12) ◽  
pp. 1541-1547
Author(s):  
Tsuyoshi YOKOSAWA ◽  
Jun-ichiro TAKAGI ◽  
Seiji KATAOKA
Keyword(s):  
Diamond Film ◽  
Cvd Diamond ◽  
Cvd Diamond Film
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