Synthesis and Field Emission Properties of Diamond Microcrystalline-Aggregate Array

2013 ◽  
Vol 664 ◽  
pp. 596-599
Author(s):  
Jin Hai Gao ◽  
Wu Qing Zhang ◽  
Zhen Li
Keyword(s):  
Field Emission ◽  
Indium Tin Oxide ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Emission Current Density ◽  
Diffraction Spectrum ◽  
Raman Scattering Spectroscopy ◽  
Emission Properties ◽  
Plasma Chemical Vapor Deposition ◽  
Field Emission Properties

The diamond microcrystalline-aggregate array was fabricated by microwave plasma chemical vapor deposition (MPCVD) method. The ceramic with a Ti mental layer is used as substrate. The diamond array was evaluated by Raman scattering spectroscopy, x-ray diffraction spectrum (XRD), scanning electron microscopy (SEM). The field emission properties were tested by using a diode structure in a vacuum. A phosphor-coated indium tin oxide (ITO) anode was used for observing and characterizing the field emission. It was found that the diamond microcrystalline-aggregate array exhibited better electron emission properties. The turn-on field is only 1.1V/μm and a emission current density as high as 1mA/cm2 was obtained under an applied field of 3.3V/μm. The good field emission properties of the diamond microcrystalline-aggregate array are discussed relating to microstructure and electrical conductivity.

Growth and Field Emission Properties of the Carbon Complex Films

2011 ◽  
Vol 295-297 ◽  
pp. 1969-1971
Author(s):  
Jin Hai Gao ◽  
Zhen Li ◽  
Wu Qing Zhang
Keyword(s):  
Field Emission ◽  
Indium Tin Oxide ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Emission Current Density ◽  
Diffraction Spectrum ◽  
Raman Scattering Spectroscopy ◽  
Emission Properties ◽  
Plasma Chemical Vapor Deposition ◽  
Field Emission Properties

The carbon complex film, Which consists of diamond grains, carbon nanotubes, amorphous carbon composition, were fabricated by microwave plasma chemical vapor deposition （MPCVD） method. The ceramic with a Ti mental layer was used as substrate. The carbon complex films were evaluated by Raman scattering spectroscopy, x-ray diffraction spectrum, scanning electron microscope. The field emission properties were tested by using a diode structure in a vacuum. A phosphor-coated indium tin oxide anode was used for observing and characterizing the field emission. The turn-on field was only 0.55V/μm and emission current density as high as 11mA/cm2 was obtained under an applied field of 2.18V/μm for the first operation. The growth mechanism and field emission properties of the carbon complex films are discussed relating to microstructure and electrical conductivity.

Investigation of the Field Emission Stability of Sphere-Like Diamond Microcrystalline-Aggregates Films

2014 ◽  
Vol 1035 ◽  
pp. 3-6
Author(s):  
Jin Hai Gao ◽  
Zhen Li ◽  
Wu Qing Zhang
Keyword(s):  
Field Emission ◽  
Indium Tin Oxide ◽  
Microwave Plasma ◽  
Metal Layer ◽  
Chemical Vapor ◽  
Emission Current Density ◽  
Diffraction Spectrum ◽  
Raman Scattering Spectroscopy ◽  
Emission Properties ◽  
Field Emission Properties

The sphere-like diamond microcrystalline-aggregates were fabricated by microwave plasma chemical vapor deposition (MPCVD) method. The ceramic with a Ti metal layer was used as substrates. The fabricated diamond microcrystalline aggregates were evaluated by Raman scattering spectroscopy, x-ray diffraction spectrum (XRD), scanning electron microscopy (SEM). The field emission properties were tested by using a diode structure in a vacuum. A phosphor-coated indium tin oxide (ITO) anode was used for observing and characterizing the field emission. It was found that the sphere-like diamond microcrystalline-aggregates films exhibited good electron emission properties. The turn-on field was only 0.55V/μm, and emission current density as high as 11mA/cm2 was obtained under an applied field of 2.18V/μm for the first operation. After several cycling operations, the field emission tended to stable characteristics of current versus voltage. The stability evolvement and mechanism are investigated relating to microstructure of the sphere-like diamond microcrystalline-aggregates films.

scholarly journals The Field Emission Properties of Graphene Aggregates Films Deposited on Fe-Cr-Ni alloy Substrates

2010 ◽  
Vol 2010 ◽  
pp. 1-4 ◽  
Author(s):  
Zhanling Lu ◽  
Wanjie Wang ◽  
Xiaotian Ma ◽  
Ning Yao ◽  
Lan Zhang ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Field Emission ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Raman Scattering Spectroscopy ◽  
Emission Properties ◽  
Plasma Chemical Vapor Deposition ◽  
Field Emission Properties ◽  
Ni Alloy

The graphene aggregates films were fabricated directly on Fe-Cr-Ni alloy substrates by microwave plasma chemical vapor deposition system (MPCVD). The source gas was a mixture of and with flow rates of 100 sccm and 12 sccm, respectively. The micro- and nanostructures of the samples were characterized by Raman scattering spectroscopy, field emission scanning electron microscopy (SEM), and transparent electron microscopy (TEM). The field emission properties of the films were measured using a diode structure in a vacuum chamber. The turn-on field was about 1.0 V/m. The current density of 2.1 mA/ at electric field of 2.4 V/m was obtained.

Comparative Studies on Field Emission Properties of Diamond and Diamond /Ti Films

2012 ◽  
Vol 586 ◽  
pp. 177-180
Author(s):  
Xin Yue Zhang ◽  
Hua Li Ma ◽  
Yong Mei Zhao ◽  
Ning Yao ◽  
Fan Guang Zeng ◽  
...  
Keyword(s):  
Field Emission ◽  
Comparative Studies ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Emission Current Density ◽  
Emission Properties ◽  
Plasma Chemical Vapor Deposition ◽  
Field Emission Properties ◽  
Threshold Voltages ◽  
Field Emission Current

Diamond film and diamond /Ti film were synthesized by microwave plasma chemical vapor deposition (MWPCVD) method on Si (100). Comparative studies on field emission properties of diamond and diamond /Ti films.The results show that diamond /Ti film has demonstrated large emission currents at much lower threshold voltages. Field emission current density increases rapidly with the increase of electric field and reaches to 1400μA/cm2 at 25 V/μm.

The Field Emission of Globe-Like Diamond Microcrystalline Aggregate Films

2011 ◽  
Vol 279 ◽  
pp. 88-92
Author(s):  
Jin Hai Gao ◽  
Wu Qing Zhang ◽  
Zhen Li
Keyword(s):  
Field Emission ◽  
Electric Fields ◽  
Current Density ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Emission Properties ◽  
Plasma Chemical Vapor Deposition ◽  
Field Emission Properties ◽  
Turn On

The globe-like diamond microcrystalline aggregates films were fabricated by microwave plasma chemical vapor deposition method. The field emission properties and emission stability of the films were tested using a diode structure in vacuum. It was found that the globe-like diamond microcrystalline aggregates films exhibited good electron emission properties and stability. The turn-on field of 0. 55 V /μm and the current density of 11mA/cm2 at the electric fields of 2.73V/μm were obtained. At the successive operator circles, the turn-on field tends to stabilize at 1. 08V /μm and the current density of 6.6 mA/cm2 is obtained.

Effect of Different Metal Composite Layer on Field Emission Properties of Diamond Film

2012 ◽  
Vol 586 ◽  
pp. 181-184
Author(s):  
Xin Yue Zhang ◽  
Hua Li Ma ◽  
Yong Mei Zhao ◽  
Ning Yao ◽  
Fan Guang Zeng
Keyword(s):  
Field Emission ◽  
Microwave Plasma ◽  
Composite Layer ◽  
Chemical Vapor ◽  
Diamond Surface ◽  
Metal Composite ◽  
Emission Properties ◽  
Plasma Chemical Vapor Deposition ◽  
Field Emission Properties ◽  
Field Emission Performance

High density、uniform particles diamond films were synthesized by microwave plasma chemical vapor deposition (MWPCVD) method on Si (100). In order to improve field emission properties of thin films, sputtering the metal Ti、Al、Mo、Ni on the diamond surface respectively，and compared the kinds of diamond/metal composite film of field emission performance. The results show that the field emission properties of diamond / metal Ti composite thin film are better. The possible mechanism will be discussed in this study.

Preparation of Chain-Like Carbon Nano-Tubes Film and its Field Emission Properties

2007 ◽  
Vol 561-565 ◽  
pp. 1153-1156
Author(s):  
Zhi Qian Wang ◽  
Jin Hai Gao ◽  
Ning Yao ◽  
Bing Lin Zhang
Keyword(s):  
Field Emission ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Emission Current Density ◽  
Reaction Chamber ◽  
Nano Structure ◽  
Emission Properties ◽  
Field Emission Properties ◽  
Carbon Nano Tubes ◽  
Deposited Films

Chain-like Carbon Nano-tubes films have been synthesized by microwave plasma enhanced chemical vapor deposition (MWPECVD). The titanium-coated ceramic substrate was placed in a stainless steel reaction chamber of MPCVD system. Prior to deposition, The substrates were grinded with SiO2 powder with Fe dopant . The mixture gas of methane (CH4) and hydrogen (H2) was introduced into the chamber. The flow rates of CH4/H2 were controlled at 14/100 sccm by mass flower, respectively. The total pressure in the chamber was kept at 6.2kPa during the deposition. The microwave power of 1700w, worked at a frequency of 2450Mhz, was applied during deposition. The deposition time was only 1minute. The nano-structure of the deposited films was analyzed by SEM, TEM and Raman spectroscopy. The chain-like nano-tubes randomly distributed on the substrates. The nano-tubes are multi-wall with diameter of about 60 nm. The field electron emission characteristics of the Chain-like Carbon Nano-tubes films were measured under the vacuum of 10-5Pa. The low turn-on field of 0.74V/μm and emission current density of 8.5mA/cm2 at electric field 2.9V//μm were obtained. The mechanism of its field emission properties was also discussed.

LaB6 nanowires and their field emission properties

2005 ◽  
Vol 901 ◽  
Author(s):  
Han Zhang ◽  
Jie Tang ◽  
Qi Zhang ◽  
Gongpu Zhao ◽  
Guang Yang ◽  
...  
Keyword(s):  
Field Emission ◽  
High Performance ◽  
Rectangular Cross Section ◽  
Chemical Vapor ◽  
Emission Current Density ◽  
Chemical Vapor Deposition Method ◽  
Emission Properties ◽  
Field Emission Properties ◽  
Electron Microscopes ◽  
Electron Emitters

AbstractFor field-induced electron emission, the two factors that enable a high emission current density at low applied voltages are (a) low work function of the emitter and (b) sharpness of the emitter tip. We have developed and applied a chemical vapor deposition method to synthesize single-crystalline LaB6 nanowires for applications as point electron emitters. The crystallographic orientation of the grown nanowires can be controlled by the catalysts used in synthesis and their typical diameter is ranged from below 20 nm to over 100 nm. The nanowires’ tip is either hemispherical or flat top with rectangular cross-section depending on the catalyst being utilized. The field emission properties have also been measured from the single nanowire emitters and the results are discussed for applications as point electron sources used in high performance electron optical instruments such as the transmission and scanning electron microscopes.

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