Structure and Optical Properties of SrBi2Nb2O9 Thin Films Fabricated by Pulsed Laser Deposition

SrBi2Nb2O9 (SBN) thin films were prepared on fused quartz substrates at room temperature by pulsed laser deposition. The crystallization behavior and surface morphology were studied at various oxygen pressures by XRD and AFM. The results indicated that the films had polycrystalline structure with a single layered perovskite phase, and exhibited higher crystalline quality, less rough surface morphology, and larger grain size with increasing oxygen pressure. The optical transmittance of the samples was measured in the wavelength range 200-900 nm, and the dispersion relation of refractive indices and wavelength was found to follow the single electron oscillation model. The energy gap of SBN films grown at oxygen pressure of 5 Pa was estimated to be around 3.88 eV by assuming a direct transition between valence and conduction bands.

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Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of (Ba0.02Sr0.98)TiO3 thin films grown on MgO substrate by pulsed laser deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.03.055 ◽

2005 ◽

Vol 485 (1-2) ◽

pp. 82-89 ◽

Cited By ~ 67

Author(s):

Can Wang ◽

B.L. Cheng ◽

S.Y. Wang ◽

H.B. Lu ◽

Y.L. Zhou ◽

...

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Pulsed Laser Deposition ◽

Deposition Rate ◽

Oxygen Pressure ◽

Pulsed Laser ◽

Lattice Parameter ◽

Laser Deposition ◽

Mgo Substrate

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Effects of growth temperature and oxygen pressure on the properties of heteroepitaxial ZnO thin films on sapphire (0001) substrates by pulsed laser deposition

physica status solidi (b) ◽

10.1002/pssb.200675127 ◽

2007 ◽

Vol 244 (5) ◽

pp. 1528-1532 ◽

Cited By ~ 5

Author(s):

Chunli Liu ◽

S. H. Chang ◽

T. W. Noh ◽

J.-H. Song ◽

J. Xie

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Oxygen Pressure ◽

Growth Temperature ◽

Pulsed Laser ◽

Laser Deposition ◽

Zno Thin Films

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Pulsed laser deposition of oriented V2O5 thin films

Journal of Materials Research ◽

10.1557/jmr.2000.0323 ◽

2000 ◽

Vol 15 (10) ◽

pp. 2249-2265 ◽

Cited By ~ 17

Author(s):

Jeanne M. McGraw ◽

John D. Perkins ◽

Falah Hasoon ◽

Philip A. Parilla ◽

Chollada Warmsingh ◽

...

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Oxygen Pressure ◽

Pulsed Laser ◽

Laser Deposition ◽

Glass Substrates ◽

Wide Range ◽

Phase Pure ◽

Amorphous Quartz ◽

Quartz Substrates

We have found that by varying only the substrate temperature and oxygen pressure five different crystallographic orientations of V2O5 thin films can be grown, ranging from amorphous to highly textured crystalline. Dense, phase-pure V2O5 thin films were grown on SnO2/glass substrates and amorphous quartz substrates by pulsed laser deposition over a wide range of temperatures and oxygen pressures. The films' microstructure, crystallinity, and texturing were characterized by electron microscopy, x-ray diffraction, and Raman spectroscopy. Temperature and oxygen pressure appeared to play more significant roles in the resulting crystallographic texture than did the choice of substrate. A growth map summarizes the results and delineates the temperature and O2 pressure window for growing dense, uniform, phase-pure V2O5 films.

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