Development of Focusing System for X-Ray Free Electron Laser
2012 ◽
Vol 516
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pp. 251-256
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Keyword(s):
X Ray
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The X-ray free electron laser (XFEL) is a new type of synchrotron facility, which can produce full coherent light at X-ray wavelength ranges. Its focusing system makes it possible to create an extremely intensive XFEL beam. Long-size focusing mirrors are necessary for this system from the viewpoint of X-ray radiation damage. We established the figuring system with an accuracy at the nanometre level. The focusing mirror has an elliptical curved shape with a length of 400 mm. Figure accuracy with a peak-to-valley height of 2 nm is achieved. The Kirkpatrick Baez focusing system was also designed and developed for two-dimensional focusing at Japanese XFEL.
2016 ◽
Vol 23
(2)
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pp. 425-429
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Keyword(s):