Basal Plane Dislocation Analysis of 4H-SiC Using Multi Directional STEM Observation
2015 ◽
Vol 821-823
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pp. 303-306
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Keyword(s):
A peculiar surface defect on a silicon carbide (SiC) epitaxial wafer, found to be associated a basal plane dislocation (BPD), was studied using a low energy scanning electron microscope (LESEM), and a novel method we are calling multi directional scanning transmission electron microscopy (MD-STEM). We have confirmed that an etch pit with double cores neighboring a peculiar surface defect is derived from the extended BPD. The BPD consisted of two partial dislocations with a stacking fault width of about 100 nm. Observation of only one viewing direction in a previous study missed the extended dislocation but through the use of the MD-STEM method in the current study, the dislocation has been confirmed to be extended into a stacking fault.
2009 ◽
Vol 24
(7)
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pp. 2191-2199
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1995 ◽
Vol 68
(2)
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pp. 342-350
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1970 ◽
Vol 28
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pp. 6-7
1986 ◽
Vol 44
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pp. 684-687
1980 ◽
Vol 38
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pp. 242-245
1988 ◽
Vol 263
(32)
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pp. 16954-16962
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