Crystalline and Electrical Properties of Polysilicon Obtained by Annealing of Si Films Produced by Low Pressure Chemical Vapor Deposition from Si2H6
1994 ◽
Vol 37-38
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pp. 305-310
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Keyword(s):
2005 ◽
Vol 8
(1-3)
◽
pp. 125-129
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Keyword(s):
Keyword(s):
2005 ◽
Vol 8
(1-3)
◽
pp. 121-124
◽
Keyword(s):
Keyword(s):
1986 ◽
Vol 15
(5)
◽
pp. 279-285
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1993 ◽
Vol 140
(9)
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pp. 2615-2621
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