Structural and electrical properties of polycrystalline silicon films deposited by low pressure chemical vapor deposition with and without plasma enhancement
1986 ◽
Vol 15
(5)
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pp. 279-285
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1987 ◽
Vol 5
(4)
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pp. 1903-1904
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1997 ◽
Vol 144
(11)
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pp. 3952-3958
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2005 ◽
Vol 8
(1-3)
◽
pp. 125-129
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Keyword(s):
2005 ◽
Vol 8
(1-3)
◽
pp. 121-124
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Keyword(s):
2001 ◽
Vol 148
(3)
◽
pp. C149
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1994 ◽
Vol 37-38
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pp. 305-310
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