Tantalum Oxide Thin Films for Dielectric Applications by Low‐Pressure Chemical Vapor Deposition: Physical and Electrical Properties
1993 ◽
Vol 140
(9)
◽
pp. 2615-2621
◽
1991 ◽
Vol 02
(C2)
◽
pp. C2-303-C2-310
◽
Keyword(s):
2014 ◽
Vol 297
◽
pp. 125-129
◽
Keyword(s):
Keyword(s):
2017 ◽
Vol 19
(8)
◽
pp. 1700193
◽
1987 ◽
Vol 5
(4)
◽
pp. 1903-1904
◽
2005 ◽
Vol 8
(1-3)
◽
pp. 125-129
◽
Keyword(s):
Keyword(s):