Ion Assisted Reactive Magnetron Sputtering as a Deposition Method for High Quality Thin Films of Compound Semiconductors

1999 ◽  
Vol 67-68 ◽  
pp. 261-268 ◽  
Author(s):  
K. Ellmer
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Compound Semiconductors ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Deposition Method ◽  
High Quality

Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

2011 ◽  
Vol 406 (13) ◽  
pp. 2658-2662 ◽  
Author(s):  
Chaoquan Hu ◽  
Liang Qiao ◽  
Hongwei Tian ◽  
Xianyi Lu ◽  
Qing Jiang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Fabrication of MgAl$_{2}$O$_{4}$ Thin Films on Ferromagnetic Heusler Alloy Fe$_{2}$CrSi by Reactive Magnetron Sputtering

2012 ◽  
Vol 51 (2) ◽  
pp. 02BM04 ◽  
Author(s):  
Naoto Fukatani ◽  
Keima Inagaki ◽  
Kenichiro Mari ◽  
Hirohito Fujita ◽  
Tetsuta Miyawaki ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Heusler Alloy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Electronic properties of Cr1−xAlxN thin films deposited by reactive magnetron sputtering

2002 ◽  
Vol 420-421 ◽  
pp. 312-317 ◽  
Author(s):  
R Sanjinés ◽  
O Banakh ◽  
C Rojas ◽  
P.E Schmid ◽  
F Lévy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Electronic Properties ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron
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