“Front-end-ization” of the Back-End

2013 ◽  
Vol 2013 (1) ◽  
pp. 000799-000803
Author(s):  
Rajiv Roy

The trend towards 3D stacking and advanced packaging has significantly altered the requirements for manufacturing tools in the back-end. Techniques and processes being adopted are beginning to resemble the front-end of 20 years ago but with updated and more affordable cost-of ownership capabilities. As an example, 0.5um defect inspection would have been considered a front-end requirement 20 years ago. Today TSV and advanced packaging techniques such as fine-pitch RDL are demanding 0.5u level inspection but at perhaps 10x improvement in wafer throughput and 20x improvement in COO. Other Front-end capabilities ranging from metrology to Advanced Process Control (APC) that are being adopted by the back-end will also be discussed.

2017 ◽  
Vol 2017 (1) ◽  
pp. 000087-000092
Author(s):  
Dario Alliata ◽  
Stephane Godny ◽  
Cleonisse Serrecchia ◽  
Tristan Combier ◽  
Astrid Sippel ◽  
...  

Abstract In this paper, Confocal Chromatic Microscopy was investigated to characterize the micro-bump fabrication process. We designed and fabricated in house a new detector that integrates through the same optical chromatic lens two light beams that are reflected into a 2D line scan camera and a spectrometer to obtain on the fly 2D and 3D information while scanning the wafer surface. We inspected 300 mm round wafers hosting arrays of copper micro-bumps down to 10 μm in width and 5 μm in height at post Cu growing and etching step. The 2D inspection revealed the presence of partial μbumps, shifted and missing μbumps. The 3D inspection could recognize shorter and taller bumps and determine the coplanarity of each bump population at die level. This information could be used to classify GOOD and BAD dies over the wafer, so that after dicing only known good dies would be used in the following advanced packaging step. In this way, the risk of shorts and / or missing contact is minimized when stacking dies either on a wafer or on a die.


2019 ◽  
Vol 2019 (1) ◽  
pp. 000260-000267
Author(s):  
Woo Han Young ◽  
Mike Marshall

Abstract Die sizes continue to shrink and packaging technologies continue to evolve, but the common thread for all of them is the need for increased precision and tighter process control limits to achieve final package yield. Nearly all packaging technologies require connections in the third dimension, above or below the die, thus adding, quite literally, a new dimension to inspection and metrology requirements. Increased focus on reliability for automotive, health care and even mobile electronics is driving the need for improved process control solutions. The combination of higher packaging complexity and the need for improved reliability are driving changes to the requirements around inspection and metrology. Vertical integration continues to grow at a pervasive rate and the need for improved process control in the third dimension is growing rapidly in order to ensure reliability. Vertical integration is designed into nearly all packaging forms, including TSV, RDL, WLP, Fan-in, Fan-out, with a focus on continued increase in the number of I/Os, the pitch of features (RDL and bump) and the overall package size increasing. This integration drives the need for 3D metrology of feature height and coplanarity. In addition, the need to augment raw 3D metrology with defect inspection and 2D metrology data enables a comprehensive view (insight) into the packaging process. Achieve total bump process control with the combination of data from: (1) 2D defect detection – voids and shorts, foreign material, misprocessing; (2) 2D metrology – bump diameter, bump position, bump presence; (3) 3D inspection – bump too tall, bump too short, statistical process control (SPC); (4) Auto classifications – data must make sense and be easy to interpret. By combining high speed 2D, 3D metrology with defect inspection and advanced analytics, the quality of process control data can be exponentially improved to enable quick time-to-results for both process development and HVM control. This paper describes the inspection and metrology challenges of bumps in advanced packaging and the next generation high-throughput bump inspection methodology for wafers with extremely high bump counts as well as the data analysis


2016 ◽  
pp. 620-624
Author(s):  
Scott Kahre

Advanced process control technology can provide sugar processors the ability to realize major revenue enhancements and/or operating cost reductions with low initial investment. One technology in particular, model predictive control (MPC), holds the potential to increase production, reduce energy costs, and reduce quality variability in a wide variety of major sugar unit operations. These include centrifugal stations, pulp dryers, extractors, diffusers, mills, evaporating crystallizers, juice purification, and more. Simple payback periods as low as two months are projected. As a PC-based add-on to existing distributed control systems (DCS) or programmable logic controller (PLC) systems, MPC acts as a multi-input, multi-output controller, utilizing predictive process response models and optimization functions to control complex processes to their optimum cost and quality constraints.


2003 ◽  
Author(s):  
Lena Zavyalova ◽  
Chong-Cheng Fu ◽  
Gary S. Seligman ◽  
Perry A. Tapp ◽  
Victor Pol

2003 ◽  
Author(s):  
Timothy D. Stanley ◽  
Richard J. Markle ◽  
Brad Van Eck ◽  
Brian K. Cusson ◽  
Matthew A. Purdy ◽  
...  

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