Characterization of Silicon Nitride Coating Films

Journal of the Korean Ceramic Society ◽

10.4191/kcers.2005.42.5.359 ◽

2005 ◽

Vol 42 (5) ◽

pp. 359-365

Keyword(s):

Silicon Nitride ◽

Nitride Coating ◽

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Characterization of plasma-deposited silicon nitride coating used for integrated circuit encapsulation

Vacuum ◽

10.1016/0042-207x(89)90395-3 ◽

1989 ◽

Vol 39 (5) ◽

pp. 504

Keyword(s):

Silicon Nitride ◽

Integrated Circuit ◽

Nitride Coating

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Characterization of plasma-deposited silicon nitride coating used for integrated circuit encapsulation

Thin Solid Films ◽

10.1016/0040-6090(87)90205-7 ◽

1987 ◽

Vol 153 (1-3) ◽

pp. 459-468 ◽

Author(s):

Vineet S. Dharmadhikari

Keyword(s):

Silicon Nitride ◽

Integrated Circuit ◽

Nitride Coating

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MATERIAL PROPERTIES ANALYSIS OF CIRCUIT SUBASSEMBLIES: QUANTITATIVE CHARACTERIZATION OF SAPPHIRE (alpha-Al203) AND SILICON NITRIDE (Si3N4) USING CRYOGENIC CYCLING

10.1615/tfec2019.ref.027456 ◽

2019 ◽

Author(s):

Kirsten A. Lovelace ◽

Sonya T. Smith

Keyword(s):

Silicon Nitride ◽

Material Properties ◽

Quantitative Characterization

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ChemInform Abstract: Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5-Hexamethylcyclotrisilazane (I) Plasmas.

10.1002/chin.198913323 ◽

1989 ◽

Vol 20 (13) ◽

Author(s):

T. A. BROOKS ◽

D. W. HESS

Keyword(s):

Silicon Nitride ◽

Silicon Carbonitride ◽

Abstract Characterization

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Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4705512 ◽

2012 ◽

Vol 30 (3) ◽

pp. 031303 ◽

Author(s):

Bayu A. Thedjoisworo ◽

David Cheung ◽

Davoud Zamani

Keyword(s):

Silicon Nitride ◽

Hydrogen Plasma ◽

Plasma Interactions

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Fabrication and surface characterization of pulsed reactive closed-field unbalanced magnetron sputtered amorphous silicon nitride films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2004.12.007 ◽

2006 ◽

Vol 200 (12-13) ◽

pp. 4144-4151 ◽

Author(s):

Zh.Q. Yao ◽

P. Yang ◽

N. Huang ◽

H. Sun ◽

G.J. Wan ◽

...

Keyword(s):

Silicon Nitride ◽

Amorphous Silicon ◽

Surface Characterization ◽

Closed Field ◽

Amorphous Silicon Nitride ◽

Silicon Nitride Films ◽

Unbalanced Magnetron

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Fabrication and characterization of silicon nitride nanopore

2013 6th International Conference on Biomedical Engineering and Informatics ◽

10.1109/bmei.2013.6746964 ◽

2013 ◽

Author(s):

Lingzhi Wu ◽

Hang Liu ◽

Yuqi Liu ◽

Hao Chen ◽

Quanjun Liu ◽

...

Keyword(s):

Silicon Nitride ◽

Fabrication And Characterization

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Characterization of the Mechanochemically Processed Silicon Nitride-Based Powders

Archives of Metallurgy and Materials ◽

10.2478/v10172-011-0136-3 ◽

2011 ◽

Vol 56 (4) ◽

Author(s):

T. Pawlik ◽

M. Sopicka-Lizer ◽

D. Michalik ◽

T. Włodek

Keyword(s):

Silicon Nitride

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Characterization of Silicon Nitride Thin Films on Si and Overlayer Growth of Si and Ge

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.4292 ◽

2001 ◽

Vol 40 (Part 1, No. 6B) ◽

pp. 4292-4298 ◽

Author(s):

Xue-Sen Wang ◽

Zongquan Li ◽

Lei Wang ◽

Yanfang Hu ◽

Guangjie Zhai ◽

...

Keyword(s):

Silicon Nitride

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Increased wafer yield in silicon ingots by the application of high purity silicon nitride-coating and high purity crucibles

Conference Record of the Thirty-first IEEE Photovoltaic Specialists Conference 2005 PVSC-05 ◽

10.1109/pvsc.2005.1488316 ◽

2005 ◽

Author(s):

B. Geyer ◽

G. Schwichtenberg ◽

A. Muller

Keyword(s):

Silicon Nitride ◽

High Purity ◽

Nitride Coating ◽

High Purity Silicon

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