The Application of Chemical Vapor Deposited Silicon Carbide to Radial Turbomachinery

1976 ◽  
Author(s):  
Richard E. Engdahl
CIRP Annals ◽  
1999 ◽  
Vol 48 (1) ◽  
pp. 277-280 ◽  
Author(s):  
Y. Namba ◽  
H. Kobayashi ◽  
H. Suzuki ◽  
K. Yamashita ◽  
N. Taniguchi

1977 ◽  
Vol 40 ◽  
pp. 57-72 ◽  
Author(s):  
J. Chin ◽  
P.K. Gantzel ◽  
R.G. Hudson

2016 ◽  
Vol 27 (12) ◽  
pp. 12340-12350 ◽  
Author(s):  
Amit Pawbake ◽  
Vaishali Waman ◽  
Ravindra Waykar ◽  
Ashok Jadhavar ◽  
Ajinkya Bhorde ◽  
...  

1998 ◽  
Vol 555 ◽  
Author(s):  
Peter A. DiFonzo ◽  
Mona Massuda ◽  
James T. Kelliher

AbstractThe stoichiometric composition and oxidation rates ( wet or dry ) of plasma enhanced chemical vapor deposited (PECVD) silicon carbide (SiC) films are effected by the deposition conditions of trimethylsilane (3MS) and carrier gas. We report the oxidation kinetics of SiC thin films deposited in a modified commercial PECVD reactor. A standard horizontal atmospheric furnace in the temperature range of 925–1100°C was used in the oxidation. Oxidized films were measured optically by commercially available interferometer and ellipsometer tools in addition to mechanically using a commercially available profilometer. Activation energies of the parabolic rates were in the range of 20.93 to 335.26 kJ/mol.


2005 ◽  
Vol 87 (21) ◽  
pp. 212114 ◽  
Author(s):  
T. Hornos ◽  
A. Gali ◽  
R. P. Devaty ◽  
W. J. Choyke

1990 ◽  
Vol 5 (11) ◽  
pp. 2706-2717 ◽  
Author(s):  
D. J. Larkin ◽  
L. V. Interrante ◽  
A. Bose

A CVD process has been developed for coating Textron-Avco SCS-6 SiC fiber with yttria. Both Y(fod)3·H2O and Y(thd)3 (fod = 1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4,6-octanedionato; thd = 2,2,6,6-tetramethyl-3,5-heptanedionato) were examined as potential Y2O3 CVD precursors. Analysis of the deposits by Auger spectroscopy indicated significant F and C'incorporation in the case of Y(fod)3 · H2O whereas, under appropriate conditions, Y(thd)3 gave a deposit which was essentially free of C and other impurities. GCFTIR analysis of the volatile products of the CVD process indicated isobutylene, tetrafluoroethylene, 1,1-difluoroethylene, fluoroform, and fluoroethylene for Y(fod)3 · H2O and mainly isobutylene and propylene for Y(thd)3. The precursor Y(thd)3 was chosen to deposit 1–2 μm of yttria on short lengths of silicon carbide fibers. The coated fibers were then incorporated into a nickel aluminide (Ni3Al) matrix by reactive sintering, with yttria affording protection from the known SiC + 2Ni ⇉ Ni2Si + C degradation process. The SiC/Ni3Al composites, before and after annealing at 1000 °C for up to 100 h, were studied by using SEM and EMPA to determine the extent of reaction. With the exception of certain portions of the fibers that were inadequately coated with yttria, complete protection of the fibers was indicated.


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