scholarly journals Implementation of High Carrier Mobility in Al-N Codoped p-Type ZnO Thin Films Fabricated by Direct Current Magnetron Sputtering with ZnO:Al2O3Ceramic Target

2011 ◽  
Vol 12 (4) ◽  
pp. 169-173 ◽  
Author(s):  
Hujie Jin ◽  
Bing Xu ◽  
Choon-Bae Park
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Carrier Mobility ◽  
Zno Thin Films ◽  
Direct Current Magnetron Sputtering ◽  
High Carrier Mobility ◽  
High Carrier ◽  
P Type

p-type conductive NiOx: Cu thin films with high carrier mobility deposited by ion beam assisted deposition

2018 ◽  
Vol 44 (3) ◽  
pp. 3291-3296 ◽  
Author(s):  
Hui Sun ◽  
Sheng-Chi Chen ◽  
Pei-Jie Chen ◽  
Sin-Liang Ou ◽  
Cheng-Yi Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Carrier Mobility ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
High Carrier Mobility ◽  
High Carrier ◽  
P Type

Thermoelectric properties of n-type Bi2Te2.7Se0.3 and p-type Bi0.5Sb1.5Te3 thin films deposited by direct current magnetron sputtering

2008 ◽  
Vol 516 (23) ◽  
pp. 8579-8583 ◽  
Author(s):  
D. Bourgault ◽  
C. Giroud Garampon ◽  
N. Caillault ◽  
L. Carbone ◽  
J.A. Aymami
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Thermoelectric Properties ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering ◽  
P Type

Effects of Continuous and Discontinuous Deposition Time in Reactive Direct Current Magnetron Sputtering of Titanium Dioxide Thin Films

2015 ◽  
Vol 1131 ◽  
pp. 251-254
Author(s):  
Montri Aiempanakit ◽  
Chantana Salawan ◽  
Kamon Aiempanakit
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Deposition Time ◽  
Spherical Shape ◽  
Contact Angles ◽  
Water Contact ◽  
Direct Current Magnetron Sputtering

The effect of continuous and discontinuous deposition time on the properties of TiO2 thin films deposited by reactive direct current magnetron sputtering (DCMS) on glass substrates was investigated. The deposition processes were designed for a condition of continuous deposition time D1 (60 min) and three conditions of discontinuous deposition time D2 (30 min × 2 times), D3 (15 min × 4 times), and D4 (1 min × 60 times). The crystal structure, surface morphology, and hydrophilicity of TiO2 thin films were characterized by X-ray diffraction, atomic force microscope, and water contact angle method, respectively. It was found that the increasing of discontinuous deposition time (conditions from D1 to D4) shows the changing of grain size from big grain size with spherical shape to small grain size with oval shape. The crystallinity of TiO2 films decrease with increasing the discontinuous deposition time. The water contact angles also decrease as a function of increasing discontinuous deposition time. These results may be explained from the accumulation of heat on the substrate which affected the phase composition and surface morphology of TiO2 thin films.

scholarly journals Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering

2011 ◽  
Vol 98 (19) ◽  
pp. 192115 ◽  
Author(s):  
Yun Seog Lee ◽  
Mark T. Winkler ◽  
Sin Cheng Siah ◽  
Riley Brandt ◽  
Tonio Buonassisi
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Hall Mobility ◽  
Cuprous Oxide ◽  
Oxide Thin Films ◽  
Direct Current Magnetron Sputtering

Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy

2013 ◽  
Vol 534 ◽  
pp. 442-445 ◽  
Author(s):  
A. Stolz ◽  
A. Soltani ◽  
B. Abdallah ◽  
J. Charrier ◽  
D. Deresmes ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering
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