Calculation of refractive index and extinction coefficient of perfluorinated polymer films using new numerical algorithm in prism coupling technique

Author(s):  
Sokolov ◽  
I.O. Goriachuk ◽  
A.S. Akhmanov
2004 ◽  
Vol 96 (12) ◽  
pp. 7147-7153 ◽  
Author(s):  
Feridun Ay ◽  
Askin Kocabas ◽  
Coskun Kocabas ◽  
Atilla Aydinli ◽  
Sedat Agan

1990 ◽  
Vol 214 ◽  
Author(s):  
A. K. M. Rahman ◽  
B. K. Mandal ◽  
X. F. Zhu ◽  
J. Kumar ◽  
S. K. Tripathy

ABSTRACTPlanar waveguides from a photocross-linkable polymer have been fabricated on glass and Si0 2 on silicon using the spin coating process. The polymer has been cross-linked by exposure to UV radiation (λ = 254nm). Prism coupling technique has been used to couple a laser beam into the waveguide structure. The waveguiding parameters such as number of modes, loss, thickness, and index of refraction of the polymer have been determined before and after crosslinking. The refractive index of the polymer before cross-linking differs significantly from that after cross-linking. No anisotropy has been observed in the refractive indices for the uncross-linked or cross-linked samples. The refractive index and thickness of the polymer film before and after cross-linking have also been measured using an ellipsometer and found to be in very good agreement with those obtained by the prism coupling technique. Dye molecules with large second order hyperpolarizability were utilized as guests into the photocross-linkable polymer matrix for second order nonlinear optical applications. Electro-optic properties of this polymeric system are reported.


2011 ◽  
Vol 36 (21) ◽  
pp. 4272 ◽  
Author(s):  
Su-Hyun Gong ◽  
Arnaud Stolz ◽  
Gi-Hwan Myeong ◽  
Elhadj Dogheche ◽  
Anisha Gokarna ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2981 ◽  
Author(s):  
Dorian Minkov ◽  
George Angelov ◽  
Radi Nestorov ◽  
Aleksey Nezhdanov ◽  
Dmitry Usanov ◽  
...  

Three AsxTe100−x films with different x and dissimilar average thickness d ¯ are characterized mainly from one interference transmittance spectrum T(λ = 300 to 3000 nm) of such film on a substrate based on the advanced optimizing envelope method (AOEM). A simple dual transformation of T(λ) is proposed and used for increasing the accuracy of computation of its envelopes T+(λ) and T−(λ) accounting for the significant glass substrate absorption especially for λ > 2500 nm. The refractive index n(λ) of As40Te60 and As98Te2 films is determined with a relative error <0.30%. As far as we know, the As80Te20 film is the only one with anomalous dispersion and the thickest, with estimated d ¯ = 1.1446 nm, ever characterized by an envelope method. It is also shown and explained why the extinction coefficient k(λ) of any of the three AsxTe100−x films is computed more accurately from the quantity Ti(λ) = [T+(λ)T−(λ)]0.5 compared to its commonly employed computation from T+(λ). The obtained results strengthen our conviction that the AOEM has a capacity for providing most accurate optical characterization of almost every dielectric or semiconductor film with d ¯ > 300 nm on a substrate, compared to all the other methods for characterization of such films only from T(λ).


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