scholarly journals The separation of gaseous mixture with composite microporous glass membranes at high temperature.

MEMBRANE ◽  
1990 ◽  
Vol 15 (2) ◽  
pp. 72-77 ◽  
Author(s):  
HARUHIKO OHYA ◽  
SUSUMU SATO ◽  
AKIRA ISHII ◽  
YOUICHI NEGISHI ◽  
KANJI MATSUMOTO
Keyword(s):  
High Temperature ◽  
Gaseous Mixture ◽  
Microporous Glass ◽  
Glass Membranes

scholarly journals The separation of gaseous mixture with composite microporous glass membrane at high temperature.

MEMBRANE ◽  
1989 ◽  
Vol 14 (2) ◽  
pp. 147-154 ◽  
Author(s):  
Haruhiko Ohya ◽  
Naohito Yoshikawa ◽  
Susumu Sato ◽  
Youichi Negishi ◽  
Kanji Matsumoto
Keyword(s):  
High Temperature ◽  
Gaseous Mixture ◽  
Glass Membrane ◽  
Microporous Glass

Properties of CAT-CVD Silicon Nitride Films and Their Application as Passivation Films

1996 ◽  
Vol 446 ◽  
Author(s):  
Shinya Okada ◽  
Hideki Matsumura
Keyword(s):  
High Temperature ◽  
Silicon Nitride ◽  
Gaseous Mixture ◽  
Chemical Vapor ◽  
Gate Insulator ◽  
Plasma Cvd ◽  
New Device ◽  
Silicon Nitride Films ◽  
Chemical Etch ◽  
Substrate Temperatures

AbstractSilicon nitride (SiNx) films have been successfully synthesized by the catalytic chemical vapor deposition (cat-CVD) method using a gaseous mixture of silane (SiH4) and ammonia (NH3). In the method, the deposition gases are decomposed by catalytic cracking reactions with a high temperature (1700°C) catalyzer near the substrates, and SiNx films can be deposited at substrate temperatures lower than 400°C without using plasma or photochemical excitation. Nearly stoichiometric Si3N4 films are formed when the flow ratio of NH3 exceeds over 100 times of that of SiH4. These cat-CVD SiNx films show excellent properties. That is, the resistivity, the breakdown voltage, the chemical etch resistance and hydrogen content in the films are almost equivalent to those of high-temperature thermal CVD films. In addition, the surface diffusion length of depositing species is about several-tens μπι and step-coverage itself is conformai. Thus, the cat-CVD SiNx films are regarded not only as a new device passivation films superior to the conventional plasma-CVD films but as a gate insulator for electon devices due to their high quality.

Technical Evaluation of Newly-Developed Inorganic Membranes for Plasma Fractionation

1989 ◽  
Vol 12 (3) ◽  
pp. 195-199
Author(s):  
K. Ozawa ◽  
K. Ohashi ◽  
T. Ide ◽  
K. Sakai
Keyword(s):  
Concentration Polarization ◽  
Dominant Factor ◽  
Transmembrane Pressure ◽  
Inorganic Membranes ◽  
Crossflow Filtration ◽  
Glass Membrane ◽  
Microporous Glass ◽  
Wall Shear ◽  
Concentration Polarization Layer ◽  
Glass Membranes

Constant transmembrane pressure experiments were made by crossflow filtration to clarify sieving characteristics of microporous glass membranes for plasma fractionation. The distribution of pore diameters is more limited in the microporous glass membranes than in currently utilized synthetic polymer membranes. The filtration resistance of the concentration polarization layer is the dominant factor in plasma fractionation. Proteins are separated more sharply with a higher wall shear rate because of destruction of the concentration polarization layer formed on membrane surfaces. Plasma fractionation using a microporous glass membrane with a pore diameter of 15 nm may allow separation of albumin and IgG at higher wall shear rates. Cascade filtration techniques using microporous glass membranes with various pore diameters may be suitable for plasma fractionation.

The separation of gaseous mixtures with composite micropore glass membranes at high temperature

1993 ◽  
Vol 18 (6) ◽  
pp. 475-479 ◽  
Author(s):  
H OHYA ◽  
S SATO ◽  
A ISHII ◽  
Y NEGISHI ◽  
K MATSUMOTO
Keyword(s):  
High Temperature ◽  
Gaseous Mixtures ◽  
Glass Membranes

Gas permeability of microporous glass membranes

1982 ◽  
Vol 39 (7) ◽  
pp. 328-331
Author(s):  
N. V. Kostina ◽  
A. I. Lelikova ◽  
A. G. Bondarenko ◽  
M. P. Mironova
Keyword(s):  
Gas Permeability ◽  
Microporous Glass ◽  
Glass Membranes

scholarly journals The separation of gaseous mixture of CO2 and CH4 with composite microporous glass on ceramic tubing.

MEMBRANE ◽  
1987 ◽  
Vol 12 (1) ◽  
pp. 55-61
Author(s):  
Haruhiko OHYA ◽  
Yoshinori TANAKA ◽  
Masahiro NIWA ◽  
Naohito YOSHIKAWA ◽  
Racop Hongladaromp ◽  
...  
Keyword(s):  
Gaseous Mixture ◽  
Microporous Glass

scholarly journals Behavior of Two Foundry Cobalt-Based Alloys Exposed to a Hot Complex Gaseous Mixture Simulating the Atmosphere in a Waste-to-Energy Boiler. Part 1: Case of the Alloy Exposed to the Complex Gas Stream

2018 ◽  
Vol 5 ◽  
pp. 1-5
Author(s):  
Lionel Aranda ◽  
Thierry Schweitzer ◽  
Patrice Berthod ◽  
Christophe Rapin ◽  
Didier Souchon ◽  
...  
Keyword(s):  
Water Vapor ◽  
High Temperature ◽  
Working Conditions ◽  
Gaseous Mixture ◽  
The Other ◽  
Waste To Energy ◽  
Gas Mixture ◽  
Refractory Materials ◽  
X Ray Diffraction ◽  
X Ray

The refractory materials required for waste-to-energy boilers endure severe working conditions, such as exposure to heat and hot oxidation / corrosion. Thanks to their high temperature properties cobalt-based alloys may respond to these properties requirements. In this work two model alloys based on cobalt and rich in chromium were elaborated by casting and samples were prepared by cutting and polishing. These samples were exposed, one to a hot complex gaseous mixture particularly aggressive reproducing the atmosphere in WtE boilers in service (presence of water vapor, di-oxygen, carbon di-oxide, hydrogen chloride), and the other to synthetic ashes, both for more than two hundreds hours. After test the samples were characterized by X-ray diffraction and SEM observations. On sample exposed to the complex gas stream a {10 to 15μm}-thick oxide scale formed on the surface of the sample exposed to the gas mixture. It involved all the elements of the alloy and it obviously developed both inwards and outwards as suggested by the position of the oxidized carbides.

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