Influences of substrate temperature on crystalline characteristics and mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering

Acta Physica Sinica ◽

10.7498/aps.57.5170 ◽

2008 ◽

Vol 57 (8) ◽

pp. 5170

Author(s):

Ding Wan-Yu ◽

Xu Jun ◽

Lu Wen-Qi ◽

Deng Xin-Lu ◽

Dong Chuang

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron

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Influence of N2 flow rate on the mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.07.191 ◽

2010 ◽

Vol 518 (8) ◽

pp. 2077-2081 ◽

Author(s):

Wanyu Ding ◽

Jun Xu ◽

Wenqi Lu ◽

Xinlu Deng ◽

Chuang Dong

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Flow Rate ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

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On the microstructural, optical and mechanical properties of hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00288-5 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 752-755 ◽

Author(s):

O. Durand-Drouhin ◽

A. Zeinert ◽

M. Benlahsen ◽

K. Zellama ◽

R. Kré ◽

...

Keyword(s):

Mechanical Properties ◽

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films ◽

Optical And Mechanical Properties ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Preparation And Characterization Of Carbon Nitride Thin Films By Electron Cyclotron Resonance (Ecr) Sputtering Method

MRS Proceedings ◽

10.1557/proc-555-419 ◽

1998 ◽

Vol 555 ◽

Author(s):

Yoshifumi Aoi ◽

Youji Tani ◽

Masaaki Hisa ◽

Eiji Kamijo

Keyword(s):

Substrate Temperature ◽

Photoelectron Spectroscopy ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

X Ray ◽

Plasma Sputtering ◽

AbstractCrystalline carbon nitride films were deposited by electron cyclotron resonance (ECR) plasma sputtering method using a carbon target and a nitrogen gas atmosphere. The deposited films were characterized by X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and X-ray diffraction (XRD). Nitrogen content of the deposited film was varied with substrate selfbias potential and substrate temperature. Bonding states of nitrogen and carbon in the deposited filns were different according to the substrate temperature, sp3 C-N bonds were observed for the film deposited at 600 °C. Crystallization of carbon nitride thin film was observed hen the deposition was carried out an elevated substrate temperature.

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Low temperature preparation of transparent, antireflective TiO2 films deposited at different O2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2012.01.012 ◽

2012 ◽

Vol 86 (9) ◽

pp. 1387-1392 ◽

Author(s):

Wen Du ◽

Yinping Ye ◽

Hongxuan Li ◽

Fei Zhao ◽

Li Ji ◽

...

Keyword(s):

Low Temperature ◽

Magnetron Sputtering ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Low Temperature Preparation ◽

Temperature Preparation

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Plasma enhanced direct current planar magnetron sputtering technique employing a twinned microwave electron cyclotron resonance plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1340654 ◽

2001 ◽

Vol 19 (2) ◽

pp. 425-428 ◽

Author(s):

Xu Jun ◽

Deng Xinlu ◽

Yu Shiji ◽

Lu Wenqi ◽

Ma Tengcai

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Planar Magnetron ◽

Resonance Plasma

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Study of the effects of discharge conditions and substrate temperature on Si epitaxial deposition using sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582269 ◽

2000 ◽

Vol 18 (3) ◽

pp. 873-878 ◽

Author(s):

Junsi Gao ◽

Junli Wang ◽

Naofumi Sakai ◽

Kanako Iwanaga ◽

Katsunori Muraoka ◽

...

Keyword(s):

Substrate Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Epitaxial Deposition ◽

Resonance Plasma

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Hydrogen-free diamond-like carbon films prepared by microwave electron cyclotron resonance plasma-enhanced direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2010.07.067 ◽

2010 ◽

Vol 519 (1) ◽

pp. 86-90 ◽

Author(s):

Lili Ru ◽

Jianjun Huang ◽

Liang Gao ◽

Bing Qi

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

Electron Cyclotron Resonance Plasma ◽

Direct Current Magnetron Sputtering ◽

Resonance Plasma

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Effects of substrate temperature and ion incident energy on silicon surface cleaning using a hydrogen plasma excited by electron cyclotron resonance

Journal of Applied Physics ◽

10.1063/1.355042 ◽

1993 ◽

Vol 74 (11) ◽

pp. 6936-6940 ◽

Author(s):

Kenji Nakashima ◽

Masahiko Ishii ◽

Tetsuo Hayakawa ◽

Ichiro Tajima ◽

Minoru Yamamoto

Keyword(s):

Substrate Temperature ◽

Cyclotron Resonance ◽

Incident Energy ◽

Silicon Surface ◽

Electron Cyclotron Resonance ◽

Hydrogen Plasma ◽

Surface Cleaning ◽

Electron Cyclotron

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Heteroepitaxial growth of InN on AlN‐nucleated (00.1) sapphire by ultrahigh vacuum electron cyclotron resonance‐assisted reactive magnetron sputtering

Applied Physics Letters ◽

10.1063/1.111451 ◽

1994 ◽

Vol 64 (21) ◽

pp. 2864-2866 ◽

Author(s):

Wayne A. Bryden ◽

Scott A. Ecelberger ◽

Thomas J. Kistenmacher

Keyword(s):

Magnetron Sputtering ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ultrahigh Vacuum ◽

Electron Cyclotron ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Heteroepitaxial Growth

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Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonance

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582039 ◽

1999 ◽

Vol 17 (4) ◽

pp. 1263-1268 ◽

Author(s):

A. del Prado ◽

F. L. Martı́nez ◽

I. Mártil ◽

G. González-Dı́az ◽

M. Fernández

Keyword(s):

Substrate Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron

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