Multiscale plasma and feature profile simulations of plasma-enhanced chemical vapor deposition and atomic layer deposition processes for titanium thin film fabrication

2020 ◽  
Vol 59 (SH) ◽  
pp. SHHB02
Author(s):  
Kazuki Denpoh ◽  
Paul Moroz ◽  
Taiki Kato ◽  
Masaaki Matsukuma
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Thin Film Fabrication ◽  
Titanium Thin Film ◽  
Layer Deposition ◽  
Film Fabrication ◽  
Deposition Processes

scholarly journals TiO 2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer

2019 ◽  
Vol 16 (12) ◽  
pp. 1900127 ◽  
Author(s):  
Morteza Aghaee ◽  
Joerie Verheyen ◽  
Alquin A. E. Stevens ◽  
Wilhelmus M. M. Kessels ◽  
Mariadriana Creatore
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Layer Deposition

RuO2 thin film fabrication with plasma-enhanced chemical vapor deposition

1999 ◽  
Vol 341 (1-2) ◽  
pp. 52-54 ◽  
Author(s):  
Sung-Eon Park ◽  
Hyun-Mi Kim ◽  
Ki-Bum Kim ◽  
Seok-Hong Min
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thin Film Fabrication ◽  
Film Fabrication

scholarly journals Development of aerosol assisted chemical vapor deposition for thin film fabrication

2016 ◽  
Author(s):  
Dwindra Wilham Maulana ◽  
Dian Marthatika ◽  
Camellia Panatarani ◽  
Jajat Yuda Mindara ◽  
I. Made Joni
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thin Film Fabrication ◽  
Film Fabrication
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