Effect of Gas Composition on TiN Thin-Film Fabrication in N2/H2/Ar/TiCl4Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition System
2001 ◽
Vol 40
(Part 1, No. 8)
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pp. 4819-4824
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2013 ◽
Vol 5
(10)
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pp. 3983-3994
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1989 ◽
Vol 47
◽
pp. 608-609
2010 ◽
Vol 157
(12)
◽
pp. H1110
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Keyword(s):