Performance Test and Evaluation of Multilevel Fresnel Zone Plate with Three-Step Profile Fabricated with Electron-Beam Lithography

2012 ◽  
Vol 51 (2R) ◽  
pp. 022502 ◽  
Author(s):  
Akihisa Takeuchi ◽  
Yoshio Suzuki ◽  
Kentaro Uesugi ◽  
Ikuo Okada ◽  
Hiroki Iriguchi
2010 ◽  
Vol 2010 ◽  
pp. 1-6 ◽  
Author(s):  
Yoshio Suzuki ◽  
Akihisa Takeuchi ◽  
Hisataka Takenaka ◽  
Ikuo Okada

A Fresnel zone plate (FZP) with 35 nm outermost zone width has been fabricated and tested in the hard X-ray region. The FZP was made by electron beam lithography and reactive ion etching technique. The performance test of the FZP was carried out by measuring the focused beam profile for coherent hard X-ray beam at the beamline 20XU of SPring-8. The full width at half maximum of the focused beam profile measured by knife-edge scan method is 34.9±2.7 nm, that agrees well with the theoretical value of diffraction-limited resolution. Applications to scanning microscopy were also carried out.


2005 ◽  
Vol 44 (4A) ◽  
pp. 1994-1998 ◽  
Author(s):  
Yoshio Suzuki ◽  
Akihisa Takeuchi ◽  
Hidekazu Takano ◽  
Hisataka Takenaka

2007 ◽  
Author(s):  
Masami Fujisawa ◽  
Hiroshi Sakai ◽  
Norio Nakamura ◽  
Hitoshi Hayano ◽  
Toshiya Muto

1996 ◽  
Vol 35 (Part 1, No. 5A) ◽  
pp. 2855-2862 ◽  
Author(s):  
Enzo Di Fabrizio ◽  
Luca Grella ◽  
Marco Baciocchi ◽  
Massimo Gentili ◽  
Daniela Peschiaroli ◽  
...  

Author(s):  
Daniel Jandura ◽  
Dusan Pudis ◽  
Tomas Mizera ◽  
Marek Vevericik ◽  
Peter Gaso

2021 ◽  
Vol 92 (2) ◽  
pp. 023701 ◽  
Author(s):  
Akihisa Takeuchi ◽  
Kentaro Uesugi ◽  
Masayuki Uesugi ◽  
Hiroyuki Toda ◽  
Kyosuke Hirayama ◽  
...  

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