scholarly journals Fabrication and Performance Test of Fresnel Zone Plate with 35 nm Outermost Zone Width in Hard X-Ray Region

2010 ◽  
Vol 2010 ◽  
pp. 1-6 ◽  
Author(s):  
Yoshio Suzuki ◽  
Akihisa Takeuchi ◽  
Hisataka Takenaka ◽  
Ikuo Okada

A Fresnel zone plate (FZP) with 35 nm outermost zone width has been fabricated and tested in the hard X-ray region. The FZP was made by electron beam lithography and reactive ion etching technique. The performance test of the FZP was carried out by measuring the focused beam profile for coherent hard X-ray beam at the beamline 20XU of SPring-8. The full width at half maximum of the focused beam profile measured by knife-edge scan method is 34.9±2.7 nm, that agrees well with the theoretical value of diffraction-limited resolution. Applications to scanning microscopy were also carried out.

2005 ◽  
Vol 44 (4A) ◽  
pp. 1994-1998 ◽  
Author(s):  
Yoshio Suzuki ◽  
Akihisa Takeuchi ◽  
Hidekazu Takano ◽  
Hisataka Takenaka

2015 ◽  
Vol 22 (3) ◽  
pp. 781-785 ◽  
Author(s):  
Su Yong Lee ◽  
Do Young Noh ◽  
Hae Cheol Lee ◽  
Chung-Jong Yu ◽  
Yeukuang Hwu ◽  
...  

Results are reported of direct-write X-ray lithography using a hard X-ray beam focused by a Fresnel zone plate with an outermost zone width of 40 nm. An X-ray beam at 7.5 keV focused to a nano-spot was employed to write arbitrary patterns on a photoresist thin film with a resolution better than 25 nm. The resulting pattern dimension depended significantly on the kind of underlying substrate, which was attributed to the lateral spread of electrons generated during X-ray irradiation. The proximity effect originated from the diffuse scattering near the focus and electron blur was also observed, which led to an increase in pattern dimension. Since focusing hard X-rays to below a 10 nm spot is currently available, the direct-write hard X-ray lithography developed in this work has the potential to be a promising future lithographic method.


2021 ◽  
Vol 92 (2) ◽  
pp. 023701 ◽  
Author(s):  
Akihisa Takeuchi ◽  
Kentaro Uesugi ◽  
Masayuki Uesugi ◽  
Hiroyuki Toda ◽  
Kyosuke Hirayama ◽  
...  

1994 ◽  
Vol 109 (3-4) ◽  
pp. 324-327 ◽  
Author(s):  
Yu.A. Basov ◽  
D.V. Roshchupkin ◽  
A.E. Yakshin

2014 ◽  
Vol 26 (2) ◽  
pp. 22003
Author(s):  
张巍巍 Zhang Weiwei ◽  
王晓方 Wang Xiaofang

1998 ◽  
Vol 146 (1-6) ◽  
pp. 25-30
Author(s):  
D.V. Roshchupkin ◽  
I.A. Schelokov ◽  
R. Tucoulou ◽  
A.S. Kondakov ◽  
M. Brunel

2004 ◽  
Vol 75 (4) ◽  
pp. 1155-1157 ◽  
Author(s):  
Yoshio Suzuki ◽  
Akihisa Takeuchi ◽  
Hidekazu Takano ◽  
Kentaro Uesugi ◽  
Toshihiko Oka ◽  
...  

1998 ◽  
Vol 524 ◽  
Author(s):  
S. Tamura ◽  
K. Ohtani ◽  
M. Yasumoto ◽  
K. Murali ◽  
N. Kamuo ◽  
...  

ABSTRACTA hard X-ray microbeam with submicrometer spot size from synchrotron radiation (SR) sources is expected to add a new dimension to various X-ray analysis methods. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. In order to develop high performance multilayer FZP for use in the hard X-ray region, Cu/Al concentric multilayers were fabricated by use of a DC sputtering deposition process. Lower Ar gas pressure or higher rotating speed of a wire substrate has been effective in forming smoother multilayer interfaces. From a focusing test of the Cu/Al FZP (100-zones) by the SR (λ= 0.154nm), microbeams of 1.5 μm φ and 0.8 μm φ have been achieved for the first- and third-order focal beams, respectively.


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