Effect of Phase Purity on Dislocation Density of Pressurized-Reactor Metalorganic Vapor Phase Epitaxy Grown InN

2012 ◽  
Vol 51 (4S) ◽  
pp. 04DH02 ◽  
Author(s):  
Takuya Iwabuchi ◽  
Yuhuai Liu ◽  
Takeshi Kimura ◽  
Yuantao Zhang ◽  
Kiattiwut Prasertsuk ◽  
...  

2012 ◽  
Vol 51 ◽  
pp. 04DH02 ◽  
Author(s):  
Takuya Iwabuchi ◽  
Yuhuai Liu ◽  
Takeshi Kimura ◽  
Yuantao Zhang ◽  
Kiattiwut Prasertsuk ◽  
...  


2000 ◽  
Vol 639 ◽  
Author(s):  
H. Miyake ◽  
H. Mizutani ◽  
K. Hiramatsu ◽  
Y. Iyechika ◽  
Y. Honda ◽  
...  

ABSTRACTGaN layers with low dislocation density have been fabricated be means of facet-controlled epitaxial lateral overgrowth (FACELO) via low-pressure metalorganic vapor phase epitaxy (LP-MOVPE). The distribution of the dislocations in FACELO GaN was inspected by observation of InGaN growth pits. For FACELO with {11-20} facets as the first step, the dislocations concentrate only in the window region. For FACELO with {11-22} facets as the first step, the dislocations exist only in the coalescence region. The double FACELO, which was FACELO with {11-20} on FACELO with {11-22}, was demonstrated and dislocation density of less than 105 cm−2 was achieved.



1999 ◽  
Vol 38 (Part 2, No. 10B) ◽  
pp. L1159-L1162 ◽  
Author(s):  
Atsushi Watanabe ◽  
Hirokazu Takahashi ◽  
Toshiyuki Tanaka ◽  
Hiroyuki Ota ◽  
Kiyofumi Chikuma ◽  
...  


1998 ◽  
Vol 512 ◽  
Author(s):  
J. Chaudhuri ◽  
M. Hooe Ng ◽  
D. D. Koleske ◽  
A. E. Wickenden ◽  
R. L. Henry

ABSTRACTHigh resolution x-ray diffraction and x-ray topography study of GaN thin films, grown on sapphire (00.1) substrate by reduced pressure metalorganic vapor phase epitaxy under various conditions, were performed. An attempt was made to correlate the mobility in films with similar carrier concentration with the strain and dislocation density. X-ray topography revealed the defects present in the film.







2020 ◽  
Vol 709 ◽  
pp. 138125
Author(s):  
Pattana Suwanyangyaun ◽  
Sakuntam Sanorpim ◽  
Kentaro Onabe


1991 ◽  
Vol 107 (1-4) ◽  
pp. 268-273 ◽  
Author(s):  
M.A. Tischler ◽  
R.M. Potemski ◽  
T.F. Kuech ◽  
F. Cardone ◽  
M.S. Goorsky ◽  
...  


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