Structural and electrical transport properties of MOVPE-grown pseudomorphic AlAs/InGaAs/InAs resonant tunneling diodes on InP substrates

2014 ◽  
Vol 53 (3) ◽  
pp. 031202 ◽  
Author(s):  
Hiroki Sugiyama ◽  
Atsushi Teranishi ◽  
Safumi Suzuki ◽  
Masahiro Asada
1998 ◽  
Vol 84 (12) ◽  
pp. 6718-6724 ◽  
Author(s):  
M. Griebel ◽  
K. M. Indlekofer ◽  
A. Förster ◽  
H. Lüth

2000 ◽  
Vol 631 ◽  
Author(s):  
J. G. Fleming ◽  
E. Chow ◽  
S.-Y. Lin

ABSTRACTResonance Tunneling Diodes (RTDs) are devices that can demonstrate very highspeed operation. Typically they have been fabricated using epitaxial techniques and materials not consistent with standard commercial integrated circuits. We report here the first demonstration of SiO2-Si-SiO2 RTDs. These new structures were fabricated using novel combinations of silicon integrated circuit processes.


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