Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

2014 ◽  
Vol 53 (3) ◽  
pp. 036503 ◽  
Author(s):  
Takahiro Kozawa ◽  
Julius Joseph Santillan ◽  
Toshiro Itani
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Stochastic Effects ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci
Keyword(s):  
Quantum Yield ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Polymer Backbone ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator ◽  
Polymer Interaction

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.

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