Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch (7 nm space width and 21 nm line width) using electron beam lithography with chemically amplified resist processes: I. Relationship between sensitivity and chemical gradient
2015 ◽
Vol 54
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pp. 056501
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2016 ◽
Vol 55
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pp. 056503
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2016 ◽
Vol 55
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pp. 106502
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2015 ◽
Vol 54
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pp. 096501
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2016 ◽
Vol 29
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pp. 809-816
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Keyword(s):
2015 ◽
Vol 54
(9)
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pp. 096703
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2002 ◽
Vol 41
(Part 1, No. 6B)
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pp. 4157-4162
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1993 ◽
Vol 11
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pp. 2807
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