ON-Current Stability of Poly-Si Thin Film Transistor with Si-rich Oxide as Intermetal Dielectric Film after Negative Bias Temperature Stress
Keyword(s):
Keyword(s):
2011 ◽
Vol 58
(9)
◽
pp. 3034-3041
◽
Keyword(s):
2017 ◽
Vol 56
(10)
◽
pp. 108001
◽
2013 ◽
Vol 9
(S1)
◽
pp. 13-16
◽
Keyword(s):
2019 ◽
Vol 66
(6)
◽
pp. 2620-2623
◽
Keyword(s):
2011 ◽
Vol 58
(10)
◽
pp. 3501-3505
◽
Keyword(s):
Keyword(s):
Keyword(s):