electron shower
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Plasma parameters controlled by remote electron shower in a double plasma device

2012 ◽  
Vol 38 (7) ◽  
pp. 590-594 ◽  
Author(s):  
M. K. Mishra ◽  
A. Phukan
Keyword(s):  
Plasma Parameters ◽  
Plasma Device ◽  
Double Plasma Device ◽  
Electron Shower

ChemInform Abstract: Characterization of TiN Films Prepared by Electron Shower, Arc Ion- Plating and Sputtering Methods.

ChemInform ◽  
2010 ◽  
Vol 26 (47) ◽  
pp. no-no
Author(s):  
H. YUMOTO ◽  
K. KANEKO ◽  
M. ISHIHARA ◽  
K. AKASI ◽  
T. KANEKO
Keyword(s):  
Arc Ion Plating ◽  
Tin Films ◽  
Ion Plating ◽  
Abstract Characterization ◽  
Electron Shower

Liquid-crystal phase transition by electron shower in a direct current complex plasma

2009 ◽  
Vol 16 (8) ◽  
pp. 083707 ◽  
Author(s):  
Giichiro Uchida ◽  
Satoru Iizuka ◽  
Noriyoshi Sato
Keyword(s):  
Phase Transition ◽  
Liquid Crystal ◽  
Direct Current ◽  
Crystal Phase ◽  
Liquid Crystal Phase ◽  
Complex Plasma ◽  
Crystal Phase Transition ◽  
Liquid Crystal Phase Transition ◽  
Electron Shower

Charge neutralization using secondary electron shower for shave-off depth profiling by focused ion beam secondary ion mass spectrometry

2008 ◽  
Vol 255 (4) ◽  
pp. 1351-1353
Author(s):  
Y. Ishizaki ◽  
T. Yamamoto ◽  
M. Fujii ◽  
M. Owari ◽  
M. Nojima ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Secondary Electron ◽  
Focused Ion Beam ◽  
Secondary Ion Mass Spectrometry ◽  
Ion Beam ◽  
Depth Profiling ◽  
Charge Neutralization ◽  
Ion Mass Spectrometry ◽  
Secondary Ion ◽  
Electron Shower

Characterizing electron shower with CHARM(R)-2 wafers on Eaten NV-8200P medium current ion implanter

2003 ◽  
Author(s):  
S. Reno ◽  
H. Gonzalez ◽  
C. Messick ◽  
W. Lukaszek ◽  
D.A. St. Angelo ◽  
...  
Keyword(s):  
Electron Shower

Characterizing electron shower with CHARM(R)-2 wafers on Eaton NV-8200P medium current ion implanter

2002 ◽  
Author(s):  
S. Reno ◽  
H. Gonzalez ◽  
C. Messick ◽  
W. Lukaszek ◽  
D.A. St. Angelo ◽  
...  
Keyword(s):  
Electron Shower

Corrosion and stability of cementite films prepared by electron shower

Vacuum ◽  
2002 ◽  
Vol 65 (3-4) ◽  
pp. 527-531 ◽  
Author(s):  
H. Yumoto ◽  
Y. Nagamine ◽  
J. Nagahama ◽  
M. Shimotomai
Keyword(s):  
Electron Shower

Cascade multiplication of a 26-GeV electron shower in a lead plate-emulsion sandwich chamber

2000 ◽  
Vol 26 (6) ◽  
pp. 499-501
Author(s):  
K. V. Aleksandrov ◽  
Yu. D. Aleshin ◽  
O. K. Egorov ◽  
V. V. Kolesnikov ◽  
G. I. Merzon ◽  
...  
Keyword(s):  
Lead Plate ◽  
Cascade Multiplication ◽  
Electron Shower

Low-Temperature Preparation of FeNxand Fe/FeNxMultilayer by Electron Shower

2000 ◽  
Vol 39 (Part 1, No. 1) ◽  
pp. 207-211
Author(s):  
Hisami Yumoto ◽  
Masashi Suzuki ◽  
Song Ji Li ◽  
Toshio Tsuchiya
Keyword(s):  
Low Temperature ◽  
Low Temperature Preparation ◽  
Electron Shower ◽  
Temperature Preparation

scholarly journals Temperature Dependence of the Hardness of Single-phase Cementite Films Prepared by An Electron-Shower PVD Method

2000 ◽  
Vol 64 (2) ◽  
pp. 134-140 ◽  
Author(s):  
Songji Li ◽  
Hisami Yumoto ◽  
Michio Shimotomai
Keyword(s):  
Temperature Dependence ◽  
Single Phase ◽  
Electron Shower
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