2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104)
Latest Publications

TOTAL DOCUMENTS

88
(FIVE YEARS 0)

H-INDEX

10
(FIVE YEARS 0)

Published By IEEE

0780363051
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Breakdown measurements of ultra-thin SiO/sub 2/ at low voltage

2002 ◽  
Author(s):  
J.H. Stathis ◽  
A. Vayshenker ◽  
P.R. Varekamp ◽  
E.Y. Wu ◽  
C. Montrose ◽  
...  
Keyword(s):  
Low Voltage

A novel 1T1C capacitor structure for high density FRAM

2002 ◽  
Author(s):  
N.W. Jang ◽  
Y.J. Song ◽  
H.H. Kim ◽  
D.J. Jung ◽  
B.J. Koo ◽  
...  
Keyword(s):  
High Density ◽  
Capacitor Structure

0.18 um modular triple self-aligned embedded split-gate flash memory

2002 ◽  
Author(s):  
R. Mih ◽  
J. Harrington ◽  
K. Houlihan ◽  
Hyun Koo Lee ◽  
K. Chan ◽  
...  
Keyword(s):  
Flash Memory

EB projection lithography for 60-80 nm ULSI fabrication

2002 ◽  
Author(s):  
K. Tokunaga ◽  
F. Koba ◽  
M. Miyasaka ◽  
Y. Takaishi ◽  
K. Noda ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Ulsi Fabrication

Scalability revisited: 100 nm PD-SOI transistors and implications for 50 nm devices

2002 ◽  
Author(s):  
K. Mistry ◽  
T. Ghani ◽  
M. Armstrong ◽  
S. Tyagi ◽  
P. Packan ◽  
...  

A high performance 0.13 μm SOI CMOS technology with Cu interconnects and low-k BEOL dielectric

2002 ◽  
Author(s):  
P. Smeys ◽  
V. McGahay ◽  
I. Yang ◽  
J. Adkisson ◽  
K. Beyer ◽  
...  
Keyword(s):  
High Performance ◽  
Cmos Technology ◽  
Cu Interconnects ◽  
Low K ◽  
Soi Cmos

A new cell technology for the scalable BST capacitor using damascene-formed pedestal electrode with a [Pt-Ir] alloy coating

2002 ◽  
Author(s):  
H. Itoh ◽  
Y. Tsunemine ◽  
A. Yutani ◽  
T. Okudaira ◽  
K. Kashihara ◽  
...  
Keyword(s):  
Alloy Coating ◽  
Cell Technology
Load More ...
Sign in / Sign up

Export Citation Format

Share Document