Micro and Nano Engineering
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99
(FIVE YEARS 89)

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Published By Elsevier

2590-0072
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

scholarly journals 80 K cryogenic stage for ice lithography

2021 ◽  
pp. 100101
Author(s):  
Rubaiyet I. Haque ◽  
Affan K. Waafi ◽  
Kim Jaemin ◽  
Danick Briand ◽  
Anpan Han

scholarly journals Etch mechanism of an Al2O3 hard mask in the Bosch process

2021 ◽  
pp. 100102
Author(s):  
Martin Drost ◽  
Steffen Marschmeyer ◽  
Mirko Fraschke ◽  
Oksana Fursenko ◽  
Florian Bärwolf ◽  
...  
Keyword(s):  
Hard Mask ◽  
Bosch Process

scholarly journals Plasma enhanced inkjet printing of particle-free silver ink on polyester fabric for electronic devices

2021 ◽  
pp. 100103
Author(s):  
Thomas D.A. Jones ◽  
Andrew C. Hourd ◽  
Tang Chung Liu ◽  
Lu-Chiang Jia ◽  
Chia-Mei Lung ◽  
...  
Keyword(s):  
Inkjet Printing ◽  
Electronic Devices ◽  
Polyester Fabric ◽  
Silver Ink

scholarly journals Design and micromachining of a stretchable two-dimensional ultrasonic array

2021 ◽  
pp. 100096
Author(s):  
Wei Liu ◽  
Weicen Chen ◽  
Chunling Zhu ◽  
Dawei Wu
Keyword(s):  
Two Dimensional ◽  
Ultrasonic Array

scholarly journals Enhanced antibacterial activity of ZnO-PMMA nanocomposites by selective plasma etching in atmospheric pressure

2021 ◽  
pp. 100098
Author(s):  
P. Dimitrakellis ◽  
G.D. Kaprou ◽  
G. Papavieros ◽  
D.C. Mastellos ◽  
V. Constantoudis ◽  
...  
Keyword(s):  
Antibacterial Activity ◽  
Plasma Etching ◽  
Atmospheric Pressure

scholarly journals Electron-beam lithography on M108Y and M35G chemically amplified DUV photoresists

2021 ◽  
pp. 100095
Author(s):  
Damien Maillard ◽  
Zdenek Benes ◽  
Niccolo Piacentini ◽  
Luis Guillermo Villanueva
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified
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