Electron-beam lithography on M108Y and M35G chemically amplified DUV photoresists
1998 ◽
Vol 41-42
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pp. 183-186
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2003 ◽
Vol 21
(6)
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pp. 3149
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2016 ◽
Vol 55
(5)
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pp. 056503
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2002 ◽
Vol 41
(Part 1, No. 6B)
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pp. 4157-4162
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2016 ◽
Vol 55
(10)
◽
pp. 106502
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2002 ◽
Vol 20
(4)
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pp. 1303
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2003 ◽
Vol 16
(3)
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pp. 451-454
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