IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113)
Latest Publications

TOTAL DOCUMENTS

28

(FIVE YEARS 0)

H-INDEX

3

(FIVE YEARS 0)

Published By IEEE

0780343387

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Constraint transformation for IC physical design

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729767 ◽

2002 ◽

Author(s):

E. Malavasi ◽

E. Charbon

Keyword(s):

Physical Design ◽

Constraint Transformation

Download Full-text

Statistical modeling of MOS transistors

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729778 ◽

2002 ◽

Author(s):

M. Conti ◽

P. Crippa ◽

S. Orcioni ◽

C. Turchetti

Keyword(s):

Statistical Modeling ◽

Mos Transistors

Download Full-text

Sensitivity study of interconnect variation using statistical experimental design

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729773 ◽

2002 ◽

Author(s):

Z.J. Lin ◽

C.J. Spanos

Keyword(s):

Experimental Design ◽

Sensitivity Study ◽

Statistical Experimental Design

Download Full-text

On the impact of dishing in metal CMP processes on circuit performance

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729772 ◽

2002 ◽

Author(s):

B.E. Stine ◽

R. Vallishayee

Keyword(s):

Circuit Performance ◽

Download Full-text

VLSI process optimization using Taguchi method with multiple-criteria approach

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729780 ◽

2002 ◽

Author(s):

M.-R. Chen

Keyword(s):

Taguchi Method ◽

Process Optimization ◽

Multiple Criteria

Download Full-text

Intrafield effects and device manufacturability: a statistical simulation approach

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729764 ◽

2002 ◽

Author(s):

Z. Krivokapic ◽

A. Minvielle ◽

W.D. Heavlin

Keyword(s):

Statistical Simulation ◽

Simulation Approach

Download Full-text

High voltage RESURF DMOS process development using DFM techniques: a case study

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729775 ◽

2002 ◽

Author(s):

M. Redford ◽

M. Fallon ◽

Z.A. Shafi ◽

J. McGinty ◽

N.S. Rankin ◽

...

Keyword(s):

High Voltage ◽

Process Development

Download Full-text

Predictive tolerance and sensitivity analysis based on parametric response surface methodology

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729784 ◽

2002 ◽

Author(s):

M. Quarantelli ◽

L. Daldoss ◽

P. Gubian ◽

C. Guardiani

Keyword(s):

Sensitivity Analysis ◽

Response Surface Methodology ◽

Response Surface ◽

Parametric Response

Download Full-text

A novel methodology of critical dimension statistical process control

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729783 ◽

2002 ◽

Author(s):

C.P. Chen ◽

A. Shyu ◽

P. Liou ◽

R.Q. Leu ◽

K. Huang ◽

...

Keyword(s):

Process Control ◽

Statistical Process Control ◽

Critical Dimension ◽

Statistical Process

Download Full-text

Methodology of MOSFET characteristics fluctuation description using BSIM3v3 SPICE model for statistical circuit simulations

IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113) ◽

10.1109/iwstm.1998.729756 ◽

2002 ◽

Author(s):

A. Azuma ◽

A. Oishi ◽

Y. Okayama ◽

K. Kasai ◽

Y. Toyoshima

Keyword(s):

Spice Model ◽

Circuit Simulations

Download Full-text