Controllable p‐to‐n Type Conductance Transition in Top‐Gated Graphene Field Effect Transistor by Interface Trap Engineering

2020 ◽  
Vol 6 (9) ◽  
pp. 2000496
Author(s):  
Songang Peng ◽  
Zhi Jin ◽  
Yao Yao ◽  
Xinnan Huang ◽  
Dayong Zhang ◽  
...  
2016 ◽  
Vol 7 ◽  
pp. 1368-1376 ◽  
Author(s):  
Faraz Najam ◽  
Kah Cheong Lau ◽  
Cheng Siong Lim ◽  
Yun Seop Yu ◽  
Michael Loong Peng Tan

A simple to implement model is presented to extract interface trap density of graphene field effect transistors. The presence of interface trap states detrimentally affects the device drain current–gate voltage relationship I ds–V gs. At the moment, there is no analytical method available to extract the interface trap distribution of metal-oxide-graphene field effect transistor (MOGFET) devices. The model presented here extracts the interface trap distribution of MOGFET devices making use of available experimental capacitance–gate voltage C tot–V gs data and a basic set of equations used to define the device physics of MOGFET devices. The model was used to extract the interface trap distribution of 2 experimental devices. Device parameters calculated using the extracted interface trap distribution from the model, including surface potential, interface trap charge and interface trap capacitance compared very well with their respective experimental counterparts. The model enables accurate calculation of the surface potential affected by trap charge. Other models ignore the effect of trap charge and only calculate the ideal surface potential. Such ideal surface potential when used in a surface potential based drain current model will result in an inaccurate prediction of the drain current. Accurate calculation of surface potential that can later be used in drain current model is highlighted as a major advantage of the model.


2012 ◽  
Author(s):  
Ozhan Koybasi ◽  
Isaac Childres ◽  
Igor Jovanovic ◽  
Yong P. Chen

2016 ◽  
Vol 3 (9) ◽  
pp. 095011 ◽  
Author(s):  
Da-Cheng Mao ◽  
Song-Ang Peng ◽  
Shao-Qing Wang ◽  
Da-Yong Zhang ◽  
Jing-Yuan Shi ◽  
...  

2015 ◽  
Vol 6 (1) ◽  
Author(s):  
Nikolai Dontschuk ◽  
Alastair Stacey ◽  
Anton Tadich ◽  
Kevin J. Rietwyk ◽  
Alex Schenk ◽  
...  

Langmuir ◽  
2018 ◽  
Vol 34 (14) ◽  
pp. 4224-4233 ◽  
Author(s):  
Benno M. Blaschke ◽  
Philip Böhm ◽  
Simon Drieschner ◽  
Bert Nickel ◽  
Jose A. Garrido

2017 ◽  
Vol 64 (10) ◽  
pp. 4302-4309 ◽  
Author(s):  
Jorge-Daniel Aguirre-Morales ◽  
Sebastien Fregonese ◽  
Chhandak Mukherjee ◽  
Wei Wei ◽  
Henri Happy ◽  
...  

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