Silicon contamination of substrates in fluorocarbon plasmas produced in glass reactors

1994 ◽  
Vol 52 (10) ◽  
pp. 1419-1429 ◽  
Author(s):  
Ferencz Denes ◽  
Majid Sarmadi ◽  
C. E. C. A. Hop ◽  
Milan Buncick ◽  
Raymond Young
Keyword(s):  
Fluorocarbon Plasmas ◽  
Silicon Contamination

CF2kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas

1997 ◽  
Vol 81 (5) ◽  
pp. 2124-2130 ◽  
Author(s):  
A. D. Tserepi ◽  
J. Derouard ◽  
J. P. Booth ◽  
N. Sadeghi
Keyword(s):  
Fluorocarbon Plasmas

scholarly journals Oxidation Behavior of Co-15wt% Cr Alloy Containing Dispersed Oxides Formed by Internal Oxidation

CORROSION ◽  
1992 ◽  
Vol 48 (12) ◽  
pp. 990-1000
Author(s):  
P. Y. Hou ◽  
Z. R. Shui ◽  
J. Stringer
Keyword(s):  
Selective Oxidation ◽  
Internal Oxidation ◽  
Relative Effectiveness ◽  
Initial Oxidation ◽  
Cr2o3 Scale ◽  
Dispersed Particles ◽  
Oxide Particles ◽  
Silicon Contamination ◽  
Nearly Continuous ◽  
Rhines Pack

Abstract Internal oxidation pretreatments of Co-15wt%Cr and Co-15wt%Cr-1 wt% Ti were carried out using a Rhines pack in quartz, in mullite, and in alumina. A dispersion of titanium oxide particles formed in the Ti-containing alloy as a result of the internal oxidation. However, silicon also diffused into all treated specimens when the pretreatments were carried out in quartz or in mullite. The effect of various pretreatments on the subsequent oxidation of these alloys was studied at 1,000°C and compared with that of a Co-15wt%Cr-1wt%Si alloy. The main purpose of this study was to determine the relative effectiveness of the dispersed oxide particles and the contaminated silicon on the selective oxidation of chromium. It was found that the oxidation behaviors of both treated alloys were strongly affected by the degree of silicon contamination. Selective oxidation of chromium to form a nearly continuous protective Cr2O3 scale was achieved with greater than 0.4 wt% silicon. The presence of dispersed particles reduced initial oxidation rate but was ineffective in promoting Cr2O3 scale formation.

SIMULATION OF SI AND SIO2 FEATURE ETCHING IN FLUOROCARBON PLASMAS

2001 ◽  
Author(s):  
GEORGE KOKKORIS ◽  
EVANGELOS GOGOLIDES ◽  
ANDREAS G. BOUDOUVIS
Keyword(s):  
Fluorocarbon Plasmas

Nanotexturing of Polystyrene Surface in Fluorocarbon Plasmas:  From Sticky to Slippery Superhydrophobicity

Langmuir ◽  
2008 ◽  
Vol 24 (9) ◽  
pp. 5044-5051 ◽  
Author(s):  
Rosa Di Mundo ◽  
Fabio Palumbo ◽  
Riccardo d'Agostino
Keyword(s):  
Polystyrene Surface ◽  
Fluorocarbon Plasmas
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