Modeling of implantation and mixing damage during etching of SiO2 over Si in fluorocarbon plasmas
2011 ◽
Vol 29
(5)
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pp. 051306
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Keyword(s):
1999 ◽
Vol 75
(7)
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pp. 792-799
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Keyword(s):
2018 ◽
Vol 36
(6)
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pp. 06B101
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Keyword(s):
1994 ◽
Vol 52
(10)
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pp. 1419-1429
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1999 ◽
Vol 17
(3)
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pp. 741-748
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2005 ◽
Vol 23
(6)
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pp. 1691-1697
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2005 ◽
Vol 23
(5)
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pp. 2198
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