Modeling of implantation and mixing damage during etching of SiO2 over Si in fluorocarbon plasmas

2011 ◽  
Vol 29 (5) ◽  
pp. 051306 ◽  
Author(s):  
Mingmei Wang ◽  
Mark J. Kushner
Keyword(s):  
1997 ◽  
Vol 81 (5) ◽  
pp. 2124-2130 ◽  
Author(s):  
A. D. Tserepi ◽  
J. Derouard ◽  
J. P. Booth ◽  
N. Sadeghi
Keyword(s):  

1994 ◽  
Vol 52 (10) ◽  
pp. 1419-1429 ◽  
Author(s):  
Ferencz Denes ◽  
Majid Sarmadi ◽  
C. E. C. A. Hop ◽  
Milan Buncick ◽  
Raymond Young

Author(s):  
GEORGE KOKKORIS ◽  
EVANGELOS GOGOLIDES ◽  
ANDREAS G. BOUDOUVIS
Keyword(s):  

Langmuir ◽  
2008 ◽  
Vol 24 (9) ◽  
pp. 5044-5051 ◽  
Author(s):  
Rosa Di Mundo ◽  
Fabio Palumbo ◽  
Riccardo d'Agostino

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