ChemInform Abstract: Structures and Energetics of Some Potential Intermediates in Titanium Nitride Chemical Vapor Deposition: TiClm(NH2)n, TiClm(NH2)nNH, and TiClm(NH2)nN. An ab initio Molecular Orbital Study.
1998 ◽
Vol 102
(26)
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pp. 5152-5157
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2000 ◽
Vol 325
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pp. 453-456
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2001 ◽
Vol 340
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pp. 343-347
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1997 ◽
Vol 36
(Part 1, No. 4B)
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pp. 2533-2544
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1997 ◽
Vol 36
(Part 1, No. 4B)
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pp. 2545-2554
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1997 ◽
Vol 36
(Part 1, No. 8)
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pp. 5259-5267
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