Structures and Energetics of Some Potential Intermediates in Titanium Nitride Chemical Vapor Deposition:  TiClm(NH2)n, TiClm(NH2)nNH, and TiClm(NH2)nN. An ab Initio Molecular Orbital Study

1998 ◽  
Vol 102 (26) ◽  
pp. 5152-5157 ◽  
Author(s):  
Anwar G. Baboul ◽  
H. Bernhard Schlegel
Keyword(s):  
Chemical Vapor Deposition ◽  
Titanium Nitride ◽  
Ab Initio ◽  
Molecular Orbital ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Molecular Orbital Study ◽  
Orbital Study

Ab initio Molecular Orbital Study of Water Absorption and Hydrolysis of Chemical Vapor Deposited SiOF Films I

1997 ◽  
Vol 36 (Part 1, No. 4B) ◽  
pp. 2533-2544 ◽  
Author(s):  
Yasushi Nakasaki ◽  
Hideshi Miyajima ◽  
Ryota Katsumata ◽  
Nobuo Hayasaka
Keyword(s):  
Ab Initio ◽  
Water Absorption ◽  
Molecular Orbital ◽  
Chemical Vapor ◽  
Molecular Orbital Study ◽  
Orbital Study ◽  
Chemical Vapor Deposited ◽  
Hydrolysis Of

Ab initio Molecular Orbital Study of Water Absorption and Hydrolysis of Chemical Vapor Deposited SiOF Films II

1997 ◽  
Vol 36 (Part 1, No. 4B) ◽  
pp. 2545-2554 ◽  
Author(s):  
Yasushi Nakasaki ◽  
Hideshi Miyajima ◽  
Ryota Katsumata ◽  
Nobuo Hayasaka
Keyword(s):  
Ab Initio ◽  
Water Absorption ◽  
Molecular Orbital ◽  
Chemical Vapor ◽  
Molecular Orbital Study ◽  
Orbital Study ◽  
Chemical Vapor Deposited ◽  
Hydrolysis Of
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